Intel Corporation

Yashesh Shroff

Michael Scott Goldstein

Sang Hun Lee

Christof Gabriel Krautschik

Daniel Tanzil

Embodiments of a pellicle, methods of fabrication and methods of use in extreme ultraviolet (EUV) photolithography are disclosed. The pellicle may include a wire mesh with a square or hexagonal geometric configuration. A thin film of a material with a high Young's modulus may be coated on at least one surface of the wire mesh. A method of fabrication may include forming at least one sacrificial layer on a surface of the wire mesh, forming a thin film on another surface of the wire mesh, and removing the sacrificial layer to form a pellicle. A method of use may include positioning a pellicle relative to a photomask to protect the photomask from particulate accumulation during an EUV photolithography process.

Pellicle, methods of fabrication and methods of use for extreme ultraviolet lithography

In one embodiment of the present invention, intervening material layers () are recessed () relative to membrane layers () thereby providing increased surface area contact between the membranes () and support posts (). Increased surface area contact assists in reducing membrane shape changes () and defects () that can result from thermal and physical stress. In an alternative embodiment, problems related to stiction during release of a stack of membranes () is reduced by using different processes to completely remove portions of intervening material layers () between membrane layers (). The first process removes the bulk of the intervening material layer (). The second process removes the remaining portions of the intervening material layer ().

Transition radiation apparatus and method therefor

In one embodiment of the present invention, thermal deformation or bending of membranes in a transition radiation emitting structure can be reduced by providing flex regions in the membranes or the membrane support structures. In a second embodiment, deformation of membranes is compensated for by fabricating the membranes to cooperatively bend in a similar manner and direction. In a third embodiment, deformation of the membrane is reduced by fabricating the membranes with an intrinsic tensile or compressive stress.

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Santa Clara, CA, United States of America

Yashesh Shroff