Semiconductor Manufacturing International (beijing) Corporation

Beijing Baidu Netcom Science and Technology Co., Ltd.

Semiconductor Manufacturing International (shanghai) Corporation

Baidu Online Network Technology (beijing) Co., Ltd.

Liaoning Upcera Co., Ltd.

Yao Xu

Cong Wang

Yuncong Zhang

Xin Huang

Jianwei Zhang

Qiang Wu

Hua Chai

Fan Zhang

Lingling He

Xiang Wen

Ying Guo

Wanjuan Zhang

Yibin Huang

Guanyin Zhu

Feng Bai

Zhan Song

Huailing Li

Jialing Li

Chunyang Wen

A dual-purpose sintering furnace including a furnace body having a furnace chamber, a first furnace mouth and a second furnace mouth which are communicated with the furnace chamber, a furnace door hinged to the furnace body and configured for closing the first furnace mouth, a blocking member lap-jointed inside the furnace chamber and configured for blocking the second furnace mouth, a sample stage, an ejection rod fixedly arranged on a sample placement face of the sample stage, a lifting device configured for driving the sample stage to raise or lower, so that the ejection rod pushes the blocking member until the second furnace mouth is opened, and so that the sample stage enters the furnace chamber through the second furnace mouth. The dual-purpose sintering furnace can complete a large amount of sintering as conventional sintering and also implement rapid sintering.

Dual-purpose sintering furnace

A method and apparatus for executing a distributed computing task are provided. The method can include: parsing an expression of the distributed computing task to obtain an operator keyword; and executing, by using an operator corresponding to the operator keyword, the distributed computing task based on an input parameter of the operator, the input parameter of the operator including at least one of: a distributed stored distributed dataset including at least one data element, a distributed stored distributed key-value pair set including at least one key-value pair, and a value of the key-value pair in the distributed key-value pair set being a distributed dataset or a distributed key-value pair set.

Method and apparatus for executing distributed computing task

Embodiments and implementations of the present disclosure provide assistant pattern configuration methods, masks and forming methods thereof, and related devices. One form of a configuration method includes: providing a main pattern having an edge extending along a first direction, where a second direction is perpendicular to the first direction, the main pattern having a first optimal focal plane in the first direction and a second optimal focal plane in the second direction when exposed, and where there is an optimal focal plane offset between the first optimal focal plane and the second optimal focal plane; providing an initial assistant pattern around the main pattern; extracting a configuration parameter of the initial assistant pattern, the configuration parameter corresponding to the optimal focal plane offset; obtaining configuration information corresponding to a preset optimal focal plane offset based on an adjustment of the configuration parameter; and configuring an assistant pattern around the main pattern according to the configuration information. Embodiments and implementations of the present disclosure can improve lithographic quality.

Assistant pattern configuration method, mask and forming method thereof, and related device

A distributed computing framework and a distributed computing method are provided. A specific embodiment of the distributed computing framework includes: a parsing unit, configured to parse an expression of a distributed computing task, and determine an operator and a field corresponding to the operator; and an operator unit, configured to provide the operator, input parameters of the operator including: the field and a field-type distributed dataset. The type of parameters received and returned by any operator may be the field-type distributed dataset, and any operator may operate on the data corresponding to the field in the field-type distributed dataset. Therefore, any operator needs to be implemented once to realize the reuse of the operator. The distributed computing task is expressed in a simple expression, which simplifies the complexity of writing a distributed computing program with the distributed computing framework used by the user.

Distributed computing framework and distributed computing method

A distributed method and apparatus for processing streaming data are disclosed. A specific implementation of the method includes: encapsulating received streaming data as a first resilient distributed dataset; performing a grouping operation on the first resilient distributed dataset based on time windows, the grouping operation comprising: assigning each data element in the first resilient distributed dataset into a group corresponding to a time window to which a recorded timestamp of the data element belongs, and forming second resilient distributed datasets comprising a limited number of data elements and respectively corresponding to the time windows; encapsulating the second resilient distributed datasets as a nested dataset comprising a plurality of the second resilient distributed datasets; passing, using a predefined traversal operator, each of the second resilient distributed datasets in the nested dataset successively to a batch operator defined in a finite dataset to perform distributed data processing.

Distributed method and apparatus for processing streaming data

A method for performing photolithography using a photo-resist is disclosed. The photo-resist comprises a first component and a second component. The method includes providing a substrate having a surface coated with the photo-resist and selectively illuminating a region of the surface of the photo-resist using light in a first wavelength band. The method further includes illuminating the entire surface of the photo-resist using light in a second wavelength band. The first and second wavelength bands are different and may not overlap. The method also includes performing a development process for the photo-resist upon illumination with the light of the first and second wavelength bands.

Photolithographic method

Growing community of inventors

Beijing, China

Yao Xu