Macronix International Co., Ltd.

Sunplus Technology Co., Ltd.

Macronix Internationalco., Ltd.

Macronix International

Yao-Wen Chang

Tao-Cheng Lu

I-Chen Yang

Guan-Wei Wu

Hsing-Wen Chang

Shih-Yu Wang

Po-Chou Chen

Chu-Yung Liu

Tao-Yuan Lin

Yung-Hsiang Chen

Wen-Jer Tsai

Chun-Chang Lu

Tsung-Hsuan Hsieh

Wei-Cheng Lin

Wei-Liang Lin

Kent Kuohua Chang

Chi-Yuan Chin

Chih-Chieh Cheng

Chen-Han Chou

Chieh-Wei He

Hui-Chih Lin

Shih Yu Wang

Che-Shih Lin

Yuan-Peng Chao

Pin-Ju Wu

Kuo-Pei Lu

Hsin-Wen Chang

Chun-Liang Lu

A memory device and an operation method thereof are provided. The operation method includes: in a programming operation, programming a plurality of threshold voltages of a plurality of switches on a plurality of string select lines and a plurality of ground select lines as a first reference threshold voltage, and programming a plurality of threshold voltages of a plurality of dummy memory cells on a plurality of dummy word lines as being gradually increased along a first direction or a second direction, and the threshold voltages of the dummy memory cells being higher than the first reference threshold voltage; wherein the first direction being from the string select lines to a plurality of word lines and the second direction being from the ground select lines to the word lines.

Memory device and operation method thereof

A memory device and an operation method thereof are provided. The operation method includes: when a read operation or a write-verify operation is completed, during a word line voltage lowering phase, synchronously applying a plurality of different gradually lowering signal line reference voltages to a plurality of ground select lines and a plurality of string select lines, wherein values of the different gradually lowering signal line reference voltages are corresponding to a plurality of signal line positions of the ground select lines and the string select lines.

A memory device and an operation method thereof are disclosed. The memory device includes a P-well region, a common source line, a ground selection line, at least one dummy ground selection line, a plurality of word lines, at least one dummy string selection line, a string selection line, at least one bit line and at least one memory string. The gates of a plurality of memory cells of the memory string are connected to the word lines. The operation method includes the following steps. Performing a read operation and applying a read voltage on the selected word line. Applying a pass voltage on other unselected word lines and the ground selection lines, etc. Before ending of the read operation, firstly decreasing voltages of the string selection line and the dummy string selection line in advance, then increasing voltage of the bit line.

A memory device includes a substrate, a laminated structure and a memory string. The laminated structure is disposed on the substrate. The laminated structure includes a plurality of insulating layers and a plurality of conductive layers alternately stacked along a first direction. The memory string is accommodated in the laminated structure along the first direction. The memory string includes a memory layer and a channel layer, and the memory layer is disposed between the laminated structure and the channel layer. At least a portion of the memory layer and the insulating layers are overlapped along the first direction.

Memory device with memory string comprising segmented memory portions and method for fabricating the same

An operating method of a non-volatile memory includes: generating a first programming pulse with a first time period to a target memory cell in a memory array; reading and verifying whether a threshold voltage of the target memory cell reaches a target voltage level; and generating a second programming pulse with a second time period to the target memory cell when the threshold voltage of the target memory cell does not reach the target voltage level, wherein the second time period is longer than the first time period.

Non-volatile memory and operating method thereof

A memory device includes a conductive strip stack structure having conductive strips and insulating layers stacked in a staggered manner and a channel opening passing through the conductive strips and the insulating layer; a memory layer disposed in the channel opening and overlying the conductive strips; a channel layer overlying the memory layer; a semiconductor pad extending upwards from a bottom of the channel opening beyond an upper surface of a bottom conductive strip, in contact with the channel layer, and electrically isolated from the conductive strips; wherein the channel layer includes a first portion having a first doping concentration and a second portion having a second doping concentration disposed on the first portion.

Memory device and method for fabricating the same

A semiconductor structure includes a first source/drain region, a second source/drain region, a channel doping region, a gate structure, a first well and a second well. The second source/drain region is disposed opposite to the first source/drain region. The channel doping region is disposed between the first source/drain region and the second source/drain region. The gate structure is disposed on the channel doping region. The first well has a first portion disposed under the first source/drain region. The second well is disposed opposite to the first well and separated from the second source/drain region. The first source/drain region, the second source/drain region and the channel doping region have a first conductive type. The first well and the second well have a second conductive type different from the first conductive type.

Semiconductor structure

A semiconductor device includes a substrate including a doped region of a first doping concentration that extends downward from an upper surface of the substrate; a first stack on the upper surface, including first insulating layers and first conductive layers alternatively stacked, a first channel layer, a first memory layer and a first conductive connector configured to receive a first voltage, the first conductive connector on the first channel layer, having a second doping concentration; a second stack on the first stack including second insulating layers and second conductive layers alternatively stacked, a second channel layer, a second memory layer, the second conductive layer configured to receive the second voltage; a second conductive connector on the second channel layer, configured to receive an erasing voltage, the first conductive connector electrically connected to the first and second channel layers; the first doping concentration smaller than the second doping concentration.

Semiconductor device and operating method thereof

A non-volatile memory and a program method thereof are provided. The program method includes: setting one of a plurality of word lines to be a program word line, setting the word lines except the program word line to be a plurality of unselected word lines; raise a voltage on the program word line from a reference voltage to a first program voltage during a first sub-time period of a program time period; raising the voltage on the program word line from the first program voltage to a second program voltage during a second sub-time period of the program time period; and raising voltages on at least part of the unselected word lines from the reference voltage to a pass voltage during the second sub-time period.

Non-volatile memory and program method thereof

A memory device comprises an array of two-transistor memory cells, two-transistor memory cells in the array including a vertical select transistor and a vertical data storage transistor. The array comprises a plurality of stacks of conductive lines, a stack of conductive lines including a select gate line and a word line adjacent the select gate line. The device comprises an array of vertical channel lines disposed through the conductive lines to a reference line, gate dielectric structures surrounding the vertical channel lines at channel regions of vertical select transistors in the array of vertical channel lines and the select gate lines, charge storage structures surrounding the vertical channel lines at channel regions of vertical data storage transistors in the array of vertical channel lines and the word lines, and bit lines coupled to the vertical channel lines via upper ends of the vertical channel lines.

Vertical GAA flash memory including two-transistor memory cells

A programming operation for high density memory, like 3D NAND flash memory, modifies the waveforms applied during program operations to mitigate unwanted disturbance of memory cells not selected for programming during the operation. Generally, the method provides for applying a bias arrangement during an interval of time between program verify pass voltages and program pass voltages in a program sequence that can include a soft ramp down, and pre-turn-on voltages designed to reduce variations in the potential distribution on floating channels of unselected NAND strings during a program operation.

NAND flash operating techniques mitigating program disturbance

A non-volatile memory device driving method, applicable to a non-volatile memory device comprising a row decoder and a memory array, comprises: utilizing the row decoder to transmit multiple word line signals to multiple word lines of the memory array; according to an address, utilizing the row decoder to switch a selected word line signal of the multiple word line signals from a predetermined voltage level to a program voltage level; utilizing the row decoder to switch at least one support word line signal of the multiple word line signals from the predetermined voltage level to a first pass voltage level; when the selected word line signal is remained at the program voltage level, utilizing the row decoder to switch the at least one support word line signal from the first pass voltage level to a higher second pass voltage level.

Non-volatile memory device and driving method thereof

A method for operating a memory array is disclosed. The memory array includes a first memory cell, a second memory cell and a third memory cell sharing a gate and arranged along an extending direction of the gate in order. The method includes the following steps. A first bias is applied to a channel of the first memory cell to program the first memory cell. A second bias is applied to a channel of the second memory cell to inhibit programming of the second memory cell. A third bias is applied to a channel of the third memory cell to program or inhibit programming of the third memory cell. The first bias and the third bias are different.

Method for operating memory array

A memory device includes N word lines, wherein the word lines include an iword line coupled to an imemory cell and an (i+1)word line coupled to an (i+1)memory cell which is disposed adjacent to the imemory cell and is a programmed memory cell, and i is an integer from 0 to (N&#x2212;2). A method of operating such a memory device method includes a reading step. In the reading step, a read voltage is provided to the iword line, a first pass voltage is provided to the (i+1)word line, and a second pass voltage is provided to the others of the word lines, wherein the second pass voltage is lower than the first pass voltage.

Method for operating a memory device

Latch-up test device and method are provided, and the method includes following steps. A set operation is performed for setting a basic test value according to a test range and setting a trigger pulse and a predetermined error value by the basic test value. A test on a test chip in a wafer under test is performed by the trigger pulse, and whether the test chip is in a latch-up state is determined. Whether to update a test range and a latch-up threshold value and whether to return to the step of performing the set operation are determined according to a determination result, the latch-up threshold value and the basic test value. When the test chip is in the latch-up state and a difference between the latch-up threshold value and the basic test value is not greater than the predetermined error value, the test on the test chip is stopped.

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Hsinchu, Taiwan

Yao-Wen Chang