Contemporary Amperex Technology (hong Kong) Limited

Yanfen Wang

Yongsheng Guo

Chuying Ouyang

Guodong Chen

Shuojian Su

Yandong Wang

Zhaohui Liu

This application provides an A/M/X crystalline material, a photovoltaic device, and preparation methods thereof. The photovoltaic device includes a photoactive crystalline material layer (). The photoactive crystalline material layer () includes a penetrating crystal grain (), where the penetrating crystal grain () is a crystal grain penetrating through the photoactive crystalline material layer (), and a percentage p of a quantity of penetrating crystal grains () in a total quantity of crystal grains of the photoactive crystalline material layer () is ≥80%. The photoactive crystalline material layer () includes a backlight side () and a backlight crystal grain (), where the backlight crystal grain () is a crystal grain exposed to the backlight side () and has a backlight crystal face exposed to the backlight side (). At least one region of the backlight side () has an average flatness index Rbeing ≤75.

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Ningde, China

Yanfen Wang