Bristol-myers Squibb Compnay

Tokyo Electron Limited

Western Digital (fremont), Inc.

Abbvie Inc.

Abbott Laboratories Corporation

Ebay, Incorporated

Pfizer Corporation

Triquint Semiconductor Corporation

Tokyo Electron Limi Ted

Eic Corporation

Wj Communications, Inc.

Abbvie Bahamas Limited

Yan Chen

Sing-Yuen Sit

Ny Sin

Donghong Li

Paul Michael Scola

Li-Qiang Sun

Lien-Chang Wang

Shankar Kumar

Xinkang Tian

Richard W Dixon

Chengbin Wu

Paul Robert Hinton

Maria A Argiriadi

Jonathan P Belk

Hua Ying

Carolyn A Cuff

Terry L Melim

Xiangdong Alan Wang

Nicholas A Meanwell

Ching-Huang Lu

Tao Pan

Alicia Regueiro-Ren

Sergey Alexandrovich Voronin

Jie Chen

Jacob Swidorski

Zheng Liu

Joel Ng

Ying Zhu

Blaze Messer

Ashawaraya Shalini

Da Song

Yat Sun Or

Piyasena Hewawasam

Andrew Charles Good

Ly Tam Phan

Alvaro Bolivar

Ying Hong

Sanjay Pundlkrao Ghatare

Jeffrey Allen Campbell

Nishith Parikh

Brian Lee Venables

Weimin Si

Guanglei Song

Jinwen Wang

Lieping Zhong

Clarence John Dunnrowicz

Jianxin Fang

Hongzhou Jiang

Chien Ping Lee

Hin Fai Chau

Baruch Perlov

Zhigang Bai

Ming Jiang

Daniel T Chu

Jinqiu Zhang

Zhenkun Ma

Andrej Mitrovic

Hanyou Chu

Richard F Clark

Ivan Maleev

Ching-Ling Meng

Ronghui Zhou

Mihail Mihaylov

Xianzhong Zeng

Xiaoyu Yang

Joseph Anthony Beynon

Nanlei Larry Wang

Wei-Guo Su

Yunhe Huang

Neil David Knutson

Lily Yao

Barry Jia-Fu Lin

El-Amine Salhi

Karin Mauge′

Yang Xiang

Karin Mauge

Joe Anthony Beynon

Frank Hin Fai Chau

Jacob J Platter

Qionglin Gao

A method of processing a substrate that includes: exposing the substrate in a plasma processing chamber to a plasma powered by applying a first power to a first electrode of the plasma processing chamber for a first time duration; and after the first time duration, determining a process endpoint by: while exposing the substrate to the plasma by applying the first power to the first electrode, applying a second power to a second electrode of the plasma processing chamber for a second time duration that is shorter than the first time duration; and obtaining an optical emission spectrum (OES) from the plasma while applying the second power to the second electrode, where an energy of the second power over the second time duration is less than an energy of the first power over a sum of the first and the second time durations by a factor of at least 2.

Method for OES data collection and endpoint detection

A method of characterizing a plasma in a plasma processing system that includes: generating a pulsed plasma in a plasma processing chamber of the plasma processing system, the pulsed plasma being powered with a pulsed power signal, each pulse of the pulsed plasma including three periods: a overshoot period, a stable-ON period, and a decay period; performing cyclic optical emission spectroscopy (OES) measurements for the pulsed plasma, the cyclic OES measurements including: obtaining first OES data during one of the three periods from more than one pulses of the pulsed plasma; and obtaining a characteristic of the pulsed plasma for the one of the three periods based only on the first OES data.

Optical emission spectroscopy for advanced process characterization

Disclosed are embodiments of an improved apparatus and system, and associated methods for optically diagnosing a semiconductor manufacturing process. A hyperspectral imaging system is used to acquire spectrally-resolved images of emissions from the plasma, in a plasma processing system. Acquired hyperspectral images may be used to determine the chemical composition of the plasma and the plasma process endpoint. Alternatively, a hyperspectral imaging system is used to acquire spectrally-resolved images of a substrate before, during, or after processing, to determine properties of the substrate or layers and features formed on the substrate, including whether a process endpoint has been reached; or before or after processing, for inspecting the substrate condition.

Optical diagnostics of semiconductor process using hyperspectral imaging

A method of processing a substrate that includes: exposing the substrate in a plasma processing chamber to a plasma powered by applying a first power to a first electrode of a plasma processing chamber; turning OFF the first power to the first electrode after the first time duration; while the first power is OFF, applying a second power to a second electrode of the plasma processing chamber for a second time duration, the second time duration being shorter than the first time duration, an energy of the second power over the second time duration is less than an energy of the first power over the first time duration by a factor of at least 2; and detecting an optical emission spectrum (OES) from species in the plasma processing chamber.

Time-resolved OES data collection

Aspects of the present disclosure provide a method for wavelength calibration of a spectrometer. The method can include receiving a calibration light signal having first spectral components of different first wavelengths; separating and projecting the first spectral components onto pixels of a detector of the spectrometer; establishing a relation between the first wavelengths and pixel numbers of first pixels on which the first spectral components are projected; calculating first residual errors between the first wavelengths and estimated wavelengths that are associated by the relation to the pixel numbers of the first pixels; receiving an optical signal having a second spectral component of a second wavelength; projecting the optical signal onto a second pixel; and calibrating the second wavelength based on a second residual error calculated based on one of the first residual errors that corresponds to a pair of the first pixels between which the second pixel is located.

Peak alignment for the wavelength calibration of a spectrometer

The present invention encompasses IL-13 binding proteins. Specifically, the invention relates to antibodies that are chimeric, CDR grafted and humanized antibodies. Preferred antibodies have high affinity for hIL-13 and neutralize hIL-13 activity in vitro and in vivo. An antibody of the invention can be a full-length antibody or an antigen-binding portion thereof. Method of making and method of using the antibodies of the invention are also provided. The antibodies, or antibody portions, of the invention are useful for detecting hIL-13 and for inhibiting hIL-13 activity, e.g., in a human subject suffering from a disorder in which hIL-13 activity is detrimental.

Interleukin-13 binding proteins

An apparatus and a method for in-situ phase determination are provided. The apparatus includes a measurement chamber configured to retain a substance, and an entrance window mounted on a side of the measurement chamber. An exit window is mounted on an opposite side of the measurement chamber, and the exit window is parallel with the entrance window. The apparatus further includes a light source configured to generate an incident light beam. The incident light beam is directed to the entrance window at a non-zero angle of incidence with respect to a normal of the entrance window. The incident light beam passes through the entrance window, the measurement chamber and the exit window to form an output light beam. A detector is positioned under the exit window and configured to collect the output light beam passing through the exit window and generate measurement data.

Optical sensor for phase determination

A method of forming a wrapped-around shielded perpendicular magnetic recording writer pole is disclosed. A structure comprising a leading shield layer and an intermediate layer disposed over the leading shield layer is provided, the intermediate layer comprising a pole material and a dielectric material. A trench is formed in the dielectric material. A non-magnetic layer in the trench is removed via an ion beam etching process. A seed layer is deposited in the trench and over the pole material. A magnetic material comprising a side shield layer is deposited on at least a portion of the seed layer.

Method of forming a fully wrapped-around shielded PMR writer pole

Methods for manufacturing electronic lapping guides (ELGs) for writer heads that closely track the pole formation of the writer heads are provided. Once such method includes forming an ELG adjacent to a writer head that is subjected to substantially all of the sub-processing actions associated with the pole formation of the writer head, lapping the pole material, measuring a resistance of the ELG during the lapping, comparing the measured resistance with a target resistance, and terminating the lapping based on the comparison of the measured resistance with the target resistance.

Methods for manufacturing electronic lapping guides for writer heads that closely track pole formation of the writer heads

A method and system provide a magnetic transducer having an air-bearing surface (ABS). The magnetic transducer includes a main pole and at least one coil for energizing the main pole. The coil(s) have a number of turns. The magnetic transducer also includes at least one shunt coupled to at least one of the number of turns. At least one remaining turn of the number of turns carries a current. The shunt(s) carry a portion of the current from the shunted turn of the number of turns. Thus, the coil(s) have an effective number of turns is less than the number of turns.

Magnetic writer having a partially shunted coil

A magnetic transducer having an air-bearing surface is described. The magnetic transducer includes a nonmagnetic layer on an underlayer, a pole having a plurality of sidewalls, a gap layer on the sidewalls, a seed layer and at least one side shield. The nonmagnetic layer has an aperture therein. The aperture is free of magnetic inclusions at the ABS. The pole is on the underlayer and within the aperture. The seed layer is for the side shield(s) and resides on the gap layer, a portion of the underlayer and a portion of the nonmagnetic layer. The side shield(s) residing on the seed layer and in the aperture. The side shield(s) are free of undercuts at the ABS.

Method for providing a side shield for a magnetic recording transducer

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Fremont, CA, United States of America

Yan Chen