Yangtze Memory Technologies Co., Ltd.

Yali Song

XiangNan Zhao

Jianquan Jia

Ying Cui

Kaikai You

Lei Jin

Hongtao Liu

Shan Li

An Zhang

Kaiwei Li

Yuanyuan Min

Ming Wang

Xinlei Jia

Li Hong Xiao

Xueqing Huang

Jinlong Zhang

Yuan-Yuan Min

Meng Lou

Ying Huang

Wenzhe Wei

Dejia Huang

Da Li

Hong Tao Liu

Xuezhun Xie

Wei Hou

Zhiyu Wang

Lihong Xiao

A programming method and a semiconductor device are provided. The semiconductor device includes a memory string that includes a plurality of first memory cells and a first dummy cell stacked in sequence, and each first memory cell is connected to a respective word line, and a gate of the first dummy cell is connected to a first dummy word line. The method includes: in a programming phase, applying a first pass voltage to a word line corresponding to a first unprogrammed memory cell, wherein the first unprogrammed memory cell is an unprogrammed memory cell of the plurality of first memory cells separated from a to-be-programmed memory cell by a first preset number of first memory cells; and after applying the first pass voltage to the word line corresponding to the first unprogrammed memory cell, applying a programming voltage to the word line corresponding to the to-be-programmed memory cell.

Programming method for semiconductor device and semiconductor device

A memory device, a memory system, and a program operation method are disclosed. In one example, at an iprogramming loop, in response to determining that index i is greater than or equal to a first preset value and less than an initial verification loop number corresponding to a target state of memory cells in the memory device, an iprogramming inhibition operation may be performed on the memory cells of the target state. Index i may be a positive integer, and the initial verification loop number may indicate a programming loop number that starts a verification operation corresponding to the target state of the memory cells.

Memory device, memory system, and program operation method thereof

A three-dimensional (3D) memory device includes a first set of word lines coupled to first memory cells, a second set of word lines coupled to second memory cells, an interface dummy word line between the first and send sets of word lines, and a peripheral circuit coupled to the first and send memory cells. The peripheral circuit is configured to apply a first voltage to the interface dummy word line in a first pre-charge period when programming a first selected memory cell in the first memory cells, and apply a second voltage lower than the first voltage to the interface dummy word line in a second pre-charge period when programming a second selected memory cell in the second memory cells. Programing the first selected memory cell is earlier than the second selected memory cell.

Three-dimensional memory device programming with reduced disturbance

A memory device includes a memory array including memory strings, each memory string comprising a plurality of first memory cells, a plurality of second memory cells, and one or more dummy memory cells between the first memory cells and the second memory cells. The first memory cells are between drain terminals of the memory strings and the dummy memory cells, and the second memory cells are between source terminals of the memory strings and the dummy memory cells. The bit lines are respectively coupled to drain terminals of the memory strings. The word lines are respectively coupled to gate terminals of the first memory cells and the second memory cells. A word line driver is configured to apply a first voltage signal to each of the word lines that are coupled to the gate terminals of the first memory cells during a pre-charge phase.

Method of performing programming operation and related memory device

A memory device may include a first set of word lines in a first zone and a second set of word lines in a second zone. When programming memory cells coupled to a first target word line of the first set of word lines, a first pass voltage may be applied to at least one word line of the first set of word lines. When programming memory cells coupled to a second target word line of the second set of word lines, a second pass voltage may be applied to at least one word line of the second set of word lines. The at least one word line of the first set of word lines and the at least one word line of the second set of word lines have been programmed. The second pass voltage may be higher than the first pass voltage.

Memory including a plurality of portions and used for reducing program disturbance and program method thereof

The present disclosure relates to a three-dimensional memory (3D) and a control method thereof. The 3D memory includes a first deck and a second deck which are stacked in a vertical direction of a substrate. The first deck and the second deck each includes a plurality of memory string. Each memory string includes a plurality of memory cells. The plurality of memory cells includes a first portion and a second portion. A diameter of channel structure corresponding to the first portion of memory cells is smaller than that of channel structure corresponding to the second portion of memory cells. The method includes performing a read operation for selected memory cells that are in at least one of the first deck or the second deck; and applying a pass voltage to non-selected memory cells other than the selected memory cells in the first deck and the second deck. A first pass voltage is lower than a second pass voltage. The first pass voltage is applied to first non-selected memory cells in the first portion, and the second pass voltage is applied to second non-selected memory cells in the second portion.

Three-dimensional memory and control method thereof

A method for operating a memory is disclosed. The memory includes a first group of word lines, a second group of word lines, a first dummy word line, and a second dummy word line. The first dummy word line and the second dummy word line are between the first group of word lines and the second group of word lines. A first pass voltage is applied to the first dummy word line and applying a second pass voltage to the second dummy word line. A program voltage is applied to a selected word line, wherein a condition is met: a first voltage difference between the first pass voltage and a first threshold voltage of a first dummy cell corresponding to the first dummy word line is different from a second voltage difference between the second pass voltage and a second threshold voltage of a second dummy cell corresponding to the second dummy word line.

Method and memory used for reducing program disturbance by adjusting voltage of dummy word line

In a method for manufacturing a memory device, a plurality of first insulating layers and a bottom select gate (BSG) layer are formed over a substrate, where the first insulating layers are disposed between the substrate and the BSG layer. One or more first dielectric trenches are formed to pass through the BSG layer and the first insulating layers, and extend in a length direction of the substrate. A plurality of word line layers and a plurality of second insulating layers are formed over the BSG layer, where the second insulating layers are disposed between the BSG layer and the word line layers. One or more common source regions are formed over the substrate to extend in the length direction of the substrate, and further extend through the BSG layer, the first insulating layers, the word line layers, and the second insulating layers.

3D NAND memory device and method of forming the same

When programming and verifying a memory device which includes a plurality of memory cells and a plurality of word lines, a first coarse programming is first performed on a first memory cell among the plurality of memory cells which is controlled by a first word line among the plurality of word lines, and then a second coarse programming is performed on a second memory cell among the plurality of memory cells which is controlled by a second word line among the plurality of word lines. Next, a first coarse verify current is used for determining whether the first memory cell passes a coarse verification and a second coarse verify current is used for determining whether the second memory cell passes a second coarse verification, wherein the second coarse verify current is smaller than the first coarse verify current.

Method of programming and verifying memory device and related memory device

A 3D memory device may include a first set of memory layers, a second set of memory layers above the first set of memory layers, and a first dummy memory layer between the first and second memory layers. The 3D memory device may include a plurality of NAND memory strings each extending through the first and second set of memory layers and the first dummy memory layer. The 3D memory device may include a word line (WL) driving circuit that, when programming one of the first set of memory layers, may be configured to apply a second pre-charge voltage to the first dummy memory layer during the pre-charge period. The second pre-charge voltage may overlap with the first pre-charge voltage and ramp down prior to the first pre-charge voltage.

A three-dimensional (3D) memory device may include a first set of memory layers, a second set of memory layers above the first set of memory layers, and a first dummy memory layer between the first and second sets of memory layers. The 3D memory device may further include a peripheral circuit that includes a word line (WL) driving circuit configured to when programming a first memory layer of the first set of memory layers, apply a first pre-charge voltage to the first dummy memory layer during a pre-charge period associated with the first memory layer, and when programming a second memory layer of the first set of memory layers located above the first memory layer, apply a second pre-charge voltage to the first dummy memory layer during a pre-charge period associated with the second memory layer. The first pre-charge voltage may be larger than the second pre-charge voltage.

Three-dimensional memory device programming with reduced threshold voltage shift

A memory includes an upper deck and a lower deck. The upper deck includes a first upper dummy word line. The lower deck includes a first lower dummy word line. A method for reducing program disturbance of the memory includes adjusting a first upper bias voltage applied to the first upper dummy word line and/or a first upper threshold voltage of the first upper dummy word line to adjust a first difference between the first upper bias voltage and the first upper threshold voltage; and adjusting a first lower bias voltage applied to the first lower dummy word line and/or a first lower threshold voltage of the first lower dummy word line to adjust a second difference between the first lower bias voltage and the first lower threshold voltage.

A memory includes a first deck including a first set of word lines, a second deck above the first deck and including a second set of word lines, and a controller. The controller is configured to apply a program voltage to a first target word line of the first set of word lines in the first deck, and apply a first pass voltage to at least one of the first set of word lines that is below the first target word line when applying the program voltage to the first target word line. The controller is also configured to apply the program voltage to a second target word line of the second set of word lines in the second deck, and apply a second pass voltage to at least one of the second set of word lines that is below the second target word line when applying the program voltage to the second target word line. The second pass voltage is greater than the first pass voltage.

A memory includes a first portion, a second portion and a controller. The first portion includes a first word line to a kth word line. The second portion is formed above the first portion and includes a (k+1)th word line to an mth word line. When an xth word line is used to perform a program operation, the controller is used to apply a first voltage to the first word line to an (x&#x2212;2)th word line, a second voltage to an (x&#x2212;1)th word line, and a third voltage to an (x+1)th word line. x, k and m are positive integers.

A memory device includes a stack of alternating word line layers and insulating layers over a substrate. The word line layers includes a bottom select gate (BSG) positioned over the substrate. The memory device includes first dielectric trenches that are formed in the BSG of the word line layers and extend in the length direction of the substrate to separate the BSG into a plurality of sub-BSGs. The memory device also includes a first common source region (CSR) that is formed over the substrate and extends in the length direction of the substrate. The first CRS further extends through the word line layers and the insulating layers in a height direction of the substrate, where the first CSR is arranged between two adjacent first dielectric trenches of the first dielectric trenches.

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Wuhan, China

Yali Song