Taiwan Semiconductor Manufacturing Comp. Ltd.

Ya Tzu Chen

Neng-Jye Yang

Chun-Li Chou

Jao Sheng Huang

Wan Hsuan Hsu

Yen-Chiu Kuo

Yu-Li Cheng

An apparatus, semiconductor device and method of manufacture are presented, wherein a hard mask layer and one or more etch stop layers are etched in an etching chamber. In an embodiment the semiconductor device is placed on a mounting platform at a first height and an etch process is performed, then the semiconductor device is moved to a second height within the chamber and a second etch process is performed, with the rotational speed of the semiconductor device reduced during movements in order to reduce the chance of cross contamination.

Growing community of inventors

Tainan, Taiwan

Ya Tzu Chen