Taiwan Semiconductor Manufacturing Comp. Ltd.

Y T Tsai

Chin-Szu Lee

Chun-Chih Lin

Cheng-Yi Wu

Yi-Ming Lin

Jian-Shin Tsai

Chao-Ching Chang

Min-Hui Lin

C H Chen

Wen-Shan Chang

An image sensor includes a substrate having a first region and a second region. The image sensor further includes a dielectric layer over the substrate. The image sensor further includes a conductive layer over the dielectric layer, wherein in the first region the conductive layer has a grid shape and in the second region a portion of the conductive layer is concave toward the substrate. The image sensor further includes a protective layer, wherein the protective layer is over the conductive layer in the first region, and over a top surface and along sidewalls of the conductive layer in the second region.

Image sensor having conductive layer and protective layer

A method of fabricating an image sensor includes depositing a first dielectric layer over a substrate, removing a portion of the first dielectric layer from the substrate to form a trench, depositing a conductive layer over the first dielectric layer and in the trench, forming a protective layer lining a top surface of the conductive layer and sidewalls and a bottom surface of the groove in the conductive layer, and removing a portion of the conductive layer to form a grid structure. A groove corresponding to the trench is formed in the conductive layer.

Image sensor and fabrication method therefor

Growing community of inventors

Hsinchu, Taiwan

Y T Tsai