Boe Technology Group Co., Ltd.

Hefei Boe Optoelectronics Technology Co., Ltd.

Xuequan Yu

Bin Wu

Kun Li

Zhiqiang Wang

Xuepei Cheng

Wenjun Shen

Wei Zhang

Xiaodong Yu

Zhiqiang Li

Zhi Peng Liu

Jiajia Liu

Dongdong Yin

Zhuyi Luo

Xing Yue

Lizhi Ren

Guangzhi Li

Xianhua Xu

Yadong Gao

A mask plate, a method for manufacturing a color film substrate and a color film substrate for decreasing the segment difference of the color filter layer are disclosed. The mask plate includes a plurality of first regions, each of the plurality of first regions corresponding to each subpixel unit; and a second region between two adjacent first regions. Each first region is respectively provided with one first subregion for forming a color filter layer pattern within an opening region of a black matrix layer, and two second subregions for forming a color filter layer pattern within a non-opening region of the black matrix layer. The first subregion is between the two second subregions. In each second subregion: along the direction away from the first subregion, the transmittance of the second subregion gradually decreases or increases.

Mask plate, method for manufacturing color film substrate and color film substrate

The present disclosure provides a method for exposure and development, a system for controlling exposure and a system for exposure and development. The method for exposure and development is configured to expose and develop a substrate when the substrate having a size larger than that of a mask. The method includes: exposing and developing a plurality of different regions of the substrate by means of the mask respectively, wherein the plurality of different regions are pieced to form an entire region which needs to be exposed and developed.

Method for exposure and development, system for controlling exposure and system for exposure and development

The invention discloses a clearance adjusting apparatus, a clearance adjusting method and a conveyance device. The clearance adjusting apparatus is used for adjusting a clearance between two opposite rollers and comprises: a driver for driving the roller to move up and down, at least one of the rollers being movable relative to the other; and a controller that stores a predetermined clearance scope being connected with the driver for controlling the driver to drive the movable roller to move up and down, so that the clearance between the two rollers falls into the predetermined clearance scope.

Clearance adjusting apparatus, clearance adjusting method and conveyance device

An alignment exposure method and a method for fabricating a display substrate are disclosed. The alignment exposure method includes a first alignment exposure process and a second alignment exposure process. Multiple groups of alignment marks are provided at an edge of at least one side of the substrate in the first alignment exposure process. At least one group of mark structures are provided at an edge of at least one side of a mask employed in the second alignment exposure process. In multiple mask alignment processes in the second alignment exposure process, each group of the at least one group of the mark structures of the mask are aligned with groups of the alignment marks at a corresponding side of the substrate group by group. The alignment exposure method is employed to realize alignment exposure of a substrate with a size larger than a size of a mask.

Alignment exposure method and method of fabricating display substrate

The present invention relates to the technical field of display, and particularly relates to a substrate damage inspection apparatus, a production system and an inspection method. The substrate damage inspection apparatus comprises a drive unit, support rods, sensors and a controller, wherein the drive unit is connected with the support rods so as to drive the support rods to ascend or descend below a substrate to be detected; and the sensors are disposed on the support rods and communicatively connect with the controller, so as to emit light beams to the substrate to be detected, receive the light beams reflected by the substrate to be detected, and feed them back to the controller. By means of the drive unit and the support rods with the sensors, the substrate damage inspection apparatus realizes damage inspection for the substrate to be detected in a vertical direction. That is, a technical solution provided by the present invention allows for damage inspection for the substrate to be detected when it vertically moves. In addition, the substrate damage inspection apparatus is simple in structure and convenient to operate, thereby having strong utility value and significance of generalization.

Substrate damage inspection apparatus, production system and inspection method

Growing community of inventors

Beijing, China

Xuequan Yu