National University of Singapore

Xuepeng Qiu

Hyunsoo Yang

Yang Wu

Young Jun Shin

William Sylvain Legrand

Kulothungasagaran Narayanapillai

In one embodiment, a SO-STT device has a non-symmetric device geometry. The device may be fabricated to have a non-symmetric magnetic pattern by tilting a shaped magnetic pattern (e.g., an ellipse, diamond, rectangle, etc. shaped magnetic pattern) such that the pattern's main (long and short) axes are tilted with respected to an in-plane current direction. Alternatively, the non-symmetric device geometry may be produced by locating the magnetic pattern away from the center of a current injection line. The non-symmetric may permit switching absent application of an external magnetic field. A SO-STT device with non-symmetric device geometry, or another type of SO-STT device, may further integrate an additional semiconductor, insulator or metal layer into the device's multilayer stack. By integrating the additional semiconductor, insulator or metal layer, a significant reduction of SO-STT switching current density may be achieved. Depending on the embodiment, the additional semiconductor, insulator or metal layer may be disposed adjacent to the FM layer, or within the FM layer, among other possibilities.

Techniques to modulate spin orbit spin transfer torques for magnetization manipulation

Various embodiments relate a method for depositing a layer onto a workpiece using plasma. The method comprises arranging the workpiece and a source material inside a vacuum chamber. The method also comprises applying energy to the source material to cause atoms of the source material to be ejected from a surface of the source material into a plasma. The method further comprises orientating the workpiece with respect to the source material to prevent direct propagation of the ejected atoms from the source material to a work surface of the workpiece and to permit deposition of the layer onto the workpiece by ejected atoms which impact the work surface after colliding with particles of the plasma. Various embodiments also provide a corresponding apparatus.

Method and an apparatus for depositing a layer onto a workpiece using plasma

A spin orbit torque-based spintronics device that includes a ferromagnet layer having a first surface and a second surface opposed to each other, a metal layer and a spacer layer covering the first surface and the second surface of the ferromagnet layer, respectively, and an dielectric layer covering either the metal layer or the spacer layer. Also disclosed are two related spin orbit torque-based spintronics devices and methods of using these three spintronics devices.

Spin orbit and spin transfer torque-based spintronics devices

Disclosed is a graphene-based terahertz device that includes a top graphene layer, a bottom graphene layer, and a middle layer disposed between the top graphene layer and the bottom graphene layer. The middle layer is a liquid crystal layer, a piezocrystal layer, an ionic liquid layer, or an ion gel layer. Also disclosed are methods of preparing different embodiments of the above-described graphene-based terahertz device.

Growing community of inventors

Singapore, Singapore

Xuepeng Qiu