Boe Technology Group Co., Ltd.

Hefei Boe Optoelectronics Technology Co., Ltd.

Chongqing Boe Display Technology Co., Ltd.

Xuepei Cheng

Wei Zhang

Zhiqiang Li

Zhi Peng Liu

Xuequan Yu

Dongdong Yin

Jun Yan

Fan He

Zhiqiang Wang

Qiang Guo

Lubiao Sun

Yunte Chen

Zhengde Liu

Huina Qiao

Yingxi Cui

Le Peng

Xuelin Zou

Xianhua Xu

A display substrate, a display panel and a display apparatus are provided. The display substrate comprises a base substrate, which includes a display area and a non-display area on one side of the display area; an encapsulation dam in the non-display area and arranged around the display area, where an organic insulating layer has a groove structure on the side of the packaging dam away from the display area; and a touch structure, which is located on the side of the organic insulating layer facing away from the base substrate, and which comprises a plurality of touch lines extending to the non-display area; an inorganic insulating layer has a hollow structure on the side of the packaging dam away from the display area, and the hollow structure covers the groove structure and does not overlap with the orthographic projection of the plurality of touch lines.

Display substrate, display panel and display apparatus

Embodiments of the present invention disclose a coating method, comprising determining a coating state of a current substrate being an uncoated state in which none of a predetermined coating is coated thereon, a coating underway state in which a part of the predetermined coating is coated thereon or a coating completion state in which all of the predetermined coating is coated thereon, when a coating suspension is detected during coating the current substrate; in a case that the current substrate is in the uncoated state, further coating the current substrate or starting coating a next substrate; and in a case that the current substrate is in the coating underway state or the coating completion state, starting coating a next substrate.

Coating method

A mask plate, a method for manufacturing a color film substrate and a color film substrate for decreasing the segment difference of the color filter layer are disclosed. The mask plate includes a plurality of first regions, each of the plurality of first regions corresponding to each subpixel unit; and a second region between two adjacent first regions. Each first region is respectively provided with one first subregion for forming a color filter layer pattern within an opening region of a black matrix layer, and two second subregions for forming a color filter layer pattern within a non-opening region of the black matrix layer. The first subregion is between the two second subregions. In each second subregion: along the direction away from the first subregion, the transmittance of the second subregion gradually decreases or increases.

Mask plate, method for manufacturing color film substrate and color film substrate

The present disclosure provides a method for exposure and development, a system for controlling exposure and a system for exposure and development. The method for exposure and development is configured to expose and develop a substrate when the substrate having a size larger than that of a mask. The method includes: exposing and developing a plurality of different regions of the substrate by means of the mask respectively, wherein the plurality of different regions are pieced to form an entire region which needs to be exposed and developed.

Method for exposure and development, system for controlling exposure and system for exposure and development

Growing community of inventors

Beijing, China

Xuepei Cheng