Cadence Design Systems, Inc.

Kla Tencor Corporation

Therma-wave, Inc.

Xuelong Cao

Jon Opsal

Hanyou Chu

Youxian Wen

Abdurrahman Sezginer

Franz X Zach

Bayram Yenikaya

Gokhan Percin

Jesus Orsely Carrero

A method for modeling samples includes the use of control points to define lines profiles and other geometric shapes. Each control point used within a model influences a shape within the model. Typically, the control points are used in a connect-the-dots fashion where a set of dots defines the outline or profile of a shape. The layers within the sample are typically modeled independently of the shape defined using the control points. The overall result is to minimize the number of parameters used to model shapes while maintaining the accuracy of the resulting scatterometry models.

Global shape definition method for scatterometry

A method for synthesizing a photomask data set from a given target layout, including the following steps: (a) providing a set of target polygons for the target layout; (b) fitting a smooth curve to a target polygon of the set of target polygons, the curve having a set of etch-target points; (c) moving the etch target points according to a model of an etch process to produce a set of lithography-target points; and (d) synthesizing a photomask data set based on a model of a lithography process and the set of lithography-target points.

Method of compensating photomask data for the effects of etch and lithography processes

Growing community of inventors

Fremont, CA, United States of America

Xuelong Cao