Micron Technology Incorporated

Xue (Gloria) Chen

Anton J deVillers

Adam L Olson

Kaveri Jain

William R Brown

Lijing Gou

Ho Seop Eom

A method of forming a semiconductor structure comprises forming pools of acidic or basic material in a substrate structure. A resist is formed over the pools of acidic or basic material and the substrate structure. The acidic or basic material is diffused from the pools into portions of the resist proximal to the pools more than into portions of the resist distal to the pools. Then, the resist is exposed to a developer to remove a greater amount of the resist portions proximal to the pools compared to the resist portions distal to the pools to form openings in the resist. The openings have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure. The method may further comprise forming features in the openings of the resist. The features have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure.

Semiconductor device structures

Methods of forming openings in semiconductor structures

Growing community of inventors

Boise, ID, United States of America

Xue (Gloria) Chen