E.i. Dupont De Nemours and Company

Solvay Sa

The Chemours Company Fc, LLC

Win Semiconductors Corp.

Nepes Corporation

Xudong Chen

William L Holstein

Mark Gerrit Roelofs

Kostantinos Kourtakis

Charles J Dubois

Jun J Liu

Robert Clayton Wheland

Ming-Hong Hung

Phan Linh Tang

Donald Frederick Lyons

Stephen E Burkhardt

Walter Tony Wohlmuth

Liang-Feng Shen

Eunhwa Jung

Jinkuk Kim

Hyoyeon Kim

Seungsun Jang

Bonggyu Kim

Gin Tsai

Shih-Hui Huang

Ray Chen

Timothy Hopkins

Donald F Lyons

The present invention relates to a composition for manufacturing a passivation layer, and specifically, to a composition for manufacturing a passivation layer and a passivation layer formed using the composition, which simultaneously exhibit effects such as a low dielectric constant, a low water absorption rate, excellent pattern formability, and excellent adhesion to an adherend surface.

Composition for manufacturing passivation layer and passivation layer using the same

The present disclosure relates to solutions for forming a fluoropolymer coatings, comprising: i) an organic solvent, and dissolved therein ii) a fluoropolymer comprising repeat units arising from specific fluoroolefin, alkyl or aryl vinyl ether and alkenyl silane monomers. The present fluoropolymer solutions have long shelf stability life, minimal to no formation of insoluble residue or gel over the period between their manufacture and use, are of a viscosity that allows for facile filtration and so are substantially free from undesirable submicron size particles, have a dissolved polymer content such that the solutions are of utility in commercial single-coat coating processes, and afford fluoropolymer coatings on substrates that have excellent adhesion to the substrate during use and over the lifetime of the electronic device.

Fluoropolymer solution for forming a fluoropolymer coating

Provided herein are copolymers that comprise copolymerized residues of a perfluorotrivinyltriazine monomer of Formula 1.  Preferred Rgroups include, without limitation, &#x2014;(CF)&#x2014; (n=1-6); &#x2014;(CF)&#x2014;[OCF(CF)CF]&#x2014; (m=1-4, p=1-4); and &#x2014;[(CF(CF)&#x2014;O)&#x2014;(CF)]&#x2014; (x=1-3, k=1-5). Preferred comonomers for copolymerization with the perfluorotrivinyltriazine monomer (1) include, without limitation, tetrafluoroethylene (TFE); vinylidene fluoride (VF2); hexafluoropropylene (HFP); vinyl fluoride (VF); EVE; PSEPVE; perfluoro-(long chain vinyl ethers); E; P; PFBE; PEVE; EVE-OH; EVE-P; PDD; and the cure-site monomers BTFB, ITFB, 8-CNVE, 8-SAVE, and the like. Also provided are methods of synthesizing the copolymers and articles comprising the copolymers.

Copolymers of perfluorotrivinyltriazine compounds and methods for synthesizing the copolymers

Electrolyte compositions comprising fluorinated acyclic carboxylic acid esters, fluorinated acyclic carbonates, and/or fluorinated acyclic ethers; co-solvents; and certain film-forming chemical compounds are described. The electrolyte compositions are useful in electrochemical cells, such as lithium ion batteries where they provide the improved performance of a combination of high capacity and high cycle life.

Nonaqueous electrolyte compositions

A low stress moisture resistant structure of semiconductor device comprises a low stress moisture resistant layer, wherein a semiconductor device is formed on a semiconductor wafer, the semiconductor device comprises at least one pad, the low stress moisture resistant layer is coated on the semiconductor device and the semiconductor wafer so that a pad top center surface of the pad is exposed. The low stress moisture resistant layer comprises a material comprising crosslinked fluoropolymer. A before-coated stress measured on the semiconductor wafer before the low stress moisture resistant layer is coated and an after-cured stress measured on the semiconductor wafer after the low stress moisture resistant layer is coated and cured define a stress difference, the stress difference is greater than or equal to &#x2212;5&#xd7;10dyne/cmand less than or equal to 5&#xd7;10dyne/cm.

Low stress moisture resistant structure of semiconductor device

Electrolyte compositions containing a solvent mixture comprising 2,2,-difluoroethyl acetate and ethylene carbonate are described. The electrolyte compositions are useful in electrochemical cells, such as lithium ion batteries.

Fluorinated electrolyte compositions

A lithium ion battery that has a spinel cathode and a nonaqueous electrolyte comprising a fluorinated acyclic carboxylic acid ester and/or a fluorinated acyclic carbonate solvent is described. The lithium ion battery operates at a high voltage (i.e. up to about 5 V) and has improved cycling performance at high temperature.

Lithium ion battery

Novel fluorinated cyclic carbonate compounds are described. These compounds may be useful as non-aqueous electrolyte solvents, specialty solvents, and starting materials and intermediates for synthesis of dyes, agricultural chemicals, and pharmaceuticals.

Fluorinated cyclic carbonates and compositions thereof

Novel multifunctional sulfone/fluorinated ester compounds are described. These compounds may be useful as non-aqueous electrolyte solvents, specialty solvents, and starting materials and intermediates for synthesis of dyes, agricultural chemicals, and pharmaceuticals.

Multifunctional sulfone/fluorinated ester solvents

Growing community of inventors

Hockessin, DE, United States of America

Xudong Chen