Nanjing University

The 28th Research Institute of China Electronics Technology Group Corporation

Xuan Wang

Bin Liu

Rong Zhang

Jibo Huang

Hui Ding

Xi Chen

Tao Tao

Yan Liu

Jing Tian

Ming Tong

Wenyi Tang

Xiangqian Xiu

Qiucheng Xu

Zili Xie

Ting Zhi

Junchi Yu

Dunjun Chen

Xu Bao

Bin Dong

Danfeng Pan

Feifan Xu

Di Jiang

Yugang Zhou

A Micro-LED array device based on III-nitride semiconductors and a method for fabricating the same are provided. The Micro-LED array device includes arrayed sector mesa structures that are formed by etching to penetrate through a p-type GaN layer and a quantum-well active layer and deep into an n-type GaN layer, a p-type electrode array deposited by evaporation on the p-type GaN layer of sector arrays, and an n-type electrode array deposited by evaporation on the n-type GaN layer. The n-type electrode array forms blocking walls to isolate the sector mesas from one another. The blocking walls, and each of the blocking walls and the annular structure surrounding the sector mesa are connected to each other.

Micro-LED array device based on III-nitride semiconductors and method for fabricating same

A multi-dimensional flight release efficiency evaluation method. The method comprises: obtaining air flow control production and operation data which mainly comprises airspace capacity information, flight scheduling basic information, flight four-dimensional trajectory information and the like through a business information comprehensive processing platform, identifying a flight object affected by flow control and a flight object restricted by flow control through processing the operation data, analyzing a flight release time-hopping degree, calculating flight release delay distribution, evaluating controlled flight release fairness, predicting a controlled flight release normal rate, comparing airspace flow capacity matching situations, establishing a multi-dimensional flight release efficiency evaluation index set, and visually displaying evaluation indexes in modes of list, histogram, line chart, radar chart and the like.

Multi-dimensional flight release efficiency evaluation method

A flight pushback state monitoring method based on multi-modal data fusion comprises: 1, constructing a control intention recognition rule, and recognizing a pushback intention from a control instruction sent by a controller; 2, constructing a flight intention recognition model, extracting an aircraft action from a real-time monitoring video, and capturing a flight intention; and 3, constructing an intention alignment fusion rule, and judging whether control intention information conflicts with flight intention information; by fusing the control intention and the flight intention, the method can realize the following auxiliary functions: timely judging whether the aircraft follows the pushback instruction sent by the controller, if a captain does not act according to the control instruction or acts arbitrarily without a control instruction, giving an inconsistent alarm, and a function of monitoring the flight pushback state is implemented.

Flight pushback state monitoring method based on multi-modal data fusion

A micro panchromatic QLED array device based on a quantum dot transfer process of deep silicon etching templates. Array-type square table structures pass through a p-type GaN layer and a quantum well active layer and are deep to an n-type GaN layer are disposed on a blue LED epitaxial wafer, wherein micro holes are formed through etching in the structures. Every 2*2 table structures constitute an RGB pixel unit. Among the four micro holes, three of the holes are filled with red light, green light and yellow light quantum dots respectively, and one of the holes emits blue light/is filled with a blue light quantum dot. Micro holes in a silicon wafer are formed through etching with a deep silicon etching technology; the micro holes in the silicon wafer are aligned with quantum dot filling areas on a micro-LED.

Micro panchromatic QLED array device based on quantum dot transfer process of deep silicon etching templates, and preparation method therefor

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Nanjing, China

Xuan Wang