Uchicago Argonne, LLC

Xingcheng Xiao

Dieter M Gruen

Orlando H Auciello

John Arthur Carlisle

A method of depositing nanocrystalline diamond film on a substrate at a rate of not less than about 0.2 microns/hour at a substrate temperature less than about 500&#xb0; C. The method includes seeding the substrate surface with nanocrystalline diamond powder to an areal density of not less than about 10sites/cm, and contacting the seeded substrate surface with a gas of about 99% by volume of an inert gas other than helium and about 1% by volume of methane or hydrogen and one or more of acetylene, fullerene and anthracene in the presence of a microwave induced plasma while maintaining the substrate temperature less than about 500&#xb0; C. to deposit nanocrystalline diamond on the seeded substrate surface at a rate not less than about 0.2 microns/hour. Coatings of nanocrystalline diamond with average particle diameters of less than about 20 nanometers can be deposited with thermal budgets of 500&#xb0; C.-4 hours or less onto a variety of substrates such as MEMS devices.

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Woodridge, IL, United States of America

Xingcheng Xiao