Beijing Naura Microelectronics Equipment Co., Ltd.

Xiaoyang Cheng

Gang Wei

Jing Jing Wei

Jing Yang

Haitao Yu

Xingcun Li

Jinzhi Bai

The present disclosure provides an adjustable capacitor comprising a ferroelectric dielectric layer, a first electrode and a second electrode disposed on opposite sides of the ferroelectric dielectric layer. The adjustable capacitor further comprises a first control electrode and a second control electrode insulated from the first electrode and the second electrode. The first control electrode and the second control electrode are configured to provide an electric field to the ferroelectric dielectric layer, to adjust a dielectric constant of the ferroelectric dielectric layer by controlling an electric field strength, thereby adjusting the capacitance between the first and the second electrodes. The present disclosure also provides an impedance matching device and a semiconductor processing apparatus. The adjustable capacitor, the impedance matching device and the semiconductor processing apparatus can adjust the capacitance of the adjustable capacitor in milliseconds, thereby accelerating the matching speed, shortening the matching time, and improving the processed result.

Adjustable capacitor, impedance matching device and semiconductor processing apparatus

A radio frequency (RF) pulse matching method includes presetting a matching threshold and initializing a pulse count value to a pulse reference value and loading pulse power to an upper electrode and a lower electrode. The upper electrode includes an upper RF power supply and a corresponding upper matching device. The lower electrode includes a lower RF power supply and a corresponding lower matching device. The method further includes collecting a pulse signal of the pulse power and calculating a matching parameter according to the pulse signal, determining a magnitude of the matching parameter relative to the matching threshold and resetting the pulse count value, causing the upper matching device to perform matching on the upper RF power supply or the lower matching device to perform matching on the lower RF power supply, and repeating processes until the upper RF power supply and the lower RF power supply are matched.

Radio frequency pulse matching method and device thereof and pulsing plasma generation system

A filter circuit is connected between a heating source and a load for filtering the load, and includes an inductor branch and a capacitor branch connected in parallel. The inductor branch includes a one-piece structured integrated component, and the integrated component is configured with a transformer function member and an inductor function member. The inductor function member is connected in series between the heating source and the transformer function member for filtering the load. The transformer function member is connected in parallel with the load for transmitting a heating electric signal output by the heating source to the load.

Filter circuit, heating circuit, and semiconductor processing apparatus

An impedance matching system is provided. The impedance matching system includes: an impedance matching device arranged between a radio frequency (RF) power supply and a reaction chamber, adapted to connect the RF power supply to the reaction chamber through a switch, and configured to automatically perform an impedance matching on an output impedance of the RF power supply and an input impedance of the impedance matching device; the switch and a load circuit, the switch being configured to enable the RF power supply to be selectively connected to the reaction chamber or to the load circuit; and a control unit configured to control the switch to connect the RF power supply to the reaction chamber or connect the RF power supply to the load circuit according to a preset timing sequence. The impedance matching device is configured to convert a continuous wave output of the RF power supply into a pulse output according to the preset timing sequence, and provide the pulse output to the reaction chamber. The preset timing sequence is obtained based on a frequency and a duty cycle of a pulsed RF signal required by a process.

Impedance matching system, impedance matching method, and semiconductor processing apparatus thereof

An impedance matching method and device for a pulsed RF power supply are provided. The impedance matching method includes: a coarse adjustment step: performing adjustment based on a current load impedance to make a current reflection coefficient |&#x393;| no greater than an ignition reflection coefficient |&#x393;t|, and setting a current position as an ignition position; a fine adjusting step: keeping the ignition position unchanged, performing real-time adjustment based on the current load impedance to realize impedance matching, and setting a current position as a matching position; and a switching step: after impedance matching is realized for the first time, switching between the ignition position and the matching position in different pulse time durations of each subsequent pulse period to realize impedance matching in different pulse periods. The impedance matching method and device may improve matching efficiency, process stability and utilization of the pulsed RF power supply.

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Beijing, China

Xiaoyang Cheng