General Atomics, Inc.

Versum Materials Us, LLC

Other

Xiaoxi Wu

Sergei Vladimirovich Ivanov

David A Hazlebeck

Jiping Zhang

Neil Osterwalder

Condensable metal halide materials, such as but not limited to tungsten hexachloride and tungsten pentachloride can be used deposit films metal or metal containing films in a chemical vapor deposition (CVD) or atomic layer deposition process. Described herein are high purity tungsten hexachloride and tungsten pentachloride systems and methods to purify tungsten hexachloride and tungsten pentachloride raw materials. There is provided a purified tungsten hexachloride and tungsten pentachloride containing less than 10 ppm, preferably less than 5 ppm, more preferably less than 1 ppm, and most preferably less than 0.5 ppm of iron and/or molybdenum; and less than 10 ppm, preferably less than 5 ppm of all other trace metals combined including but not limited to aluminum, potassium and sodium.

Ultra-high purity tungsten chlorides

Certain embodiments and aspects relate to a photobioreactor including encapsulating photobioreactor units (EPU) within which a liquid medium and a gas are encapsulated. The liquid medium comprises at least one species of phototrophic or mixotrophic organism therein. The gas comprises a high concentration of carbon dioxide. Certain methods of using the EPUs for algal biomass production use automated function units.

Photobioreactor systems and methods for producing biomass

Condensable metal halide materials, such as but not limited to tungsten chloride (WCl), can be used to deposit metal films or metal containing films in a chemical vapor deposition (CVD) or atomic layer deposition process. Described herein are high purity compositions comprising condensable materials and methods to purify condensable materials. In one aspect, there is provided a composition comprising: tungsten hexachloride which is substantially free of at least one impurity and wherein the tungsten hexachloride comprises at least 90%, preferably 95% and more preferably 99% by weight or greater of a &#x3b2;-WCland 5% by weight or less of the &#x3b1;-WClas measured by X-ray diffraction.

High purity tungsten hexachloride and method for making same

A system and method for using a pulse flow to circulate algae in an algae cultivation apparatus are provided. In order to counteract the negative effects of biofouling on algae cultivation equipment, a pulse flow is created to periodically move through an algae cultivation apparatus. The pulse flow will dislodge algae cells adhering to various surfaces of the apparatus, and it will also create turbulence to stir up any algae cells which may have settled onto the bottom of the apparatus. To produce an increased fluid flow rate required to create an effective pulse flow, a sump, which is periodically filled with drawn algal culture from the apparatus, is located at an elevated position above the apparatus. When released, the algal culture travels through a transfer pipe and into the apparatus with gravity causing the algal culture to flow at a very high rate.

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Encinitas, CA, United States of America

Xiaoxi Wu