Kotura, Inc.

Kotusa, Inc.

Lightcross, Inc.

Lighteross, Inc.

Xiaoming Yin

Dazeng Feng

Wei Qian

Joan Fong

Dawei Zheng

Trenton Gary Coroy

Zhian Shao

Lih-Jou Chung

Wenhua Lin

Cheng-Chih Kung

Chi Wu

Liwei Wang

Shih-Hsiang Hsu

A method of fabricating an optical component includes forming a mask on an optical component precursor. The method also includes etching through at least a portion of the mask so as to etch an underlying medium concurrently with remaining mask and transfer a feature of an upper surface of the mask onto an upper surface of the underlying medium. The etch can be configured such that a ratio of the underlying medium etch rate to the mask etch rate is less than about 1.5:1. In some instances, the underlying medium is silicon and the mask is a photoresist.

Controlled selectivity etch for use with optical component fabrication

An optical device having one or more optical components is disclosed. A waveguide extends from an optical component to a testing port configured to receive a light signal from a position over the optical device and to insert the light signal into the waveguide. In some instances, the testing port is configured to receive a light signal from the waveguide and to direct the light signal to a location over the optical device. The optical device can be positioned on a wafer before being separated from the wafer. The waveguide can extend from an optical component over the perimeter of the optical device such that the testing ports are located outside the perimeter of the optical device.

Wafer level testing of optical components

A method of forming an optical component includes forming a first mask on an optical component precursor. The first mask is formed with a plurality of waveguide portions extending from a common portion. Each waveguide portion is positioned so as to protect a waveguide region of the optical component precursor where a waveguide is to be formed. The method also includes forming a second mask between waveguide portions of the first mask. The resistance of the second mask to etching varies along at least one dimension of the second mask.

Optical component having waveguides extending from a common region

An optical component is disclosed. The optical component includes a tap waveguide and a primary waveguide positioned on a base. The tap waveguide is configured to receive a portion of a light signal traveling along the primary waveguide. The portion of the light signal received by the tap waveguide is the tapped portion of the light signal. A direction changing region is configured to receive the tapped portion of the light signal from the tap waveguide and to direct the tapped portion of the light signal travels away from the base. A light sensor is configured to receive the tapped portion of the light signal from the direction changing region.

Waveguide tap monitor

An add/drop node is disclosed. The add/drop node includes a first filter configured to receive a light beam having a plurality of channels. The first filter is also configured to direct channels having wavelengths falling within a plurality of first wavelength bands to a transition waveguide. The add/drop node also includes a second filter configured to receive the channels directed to the transition waveguide. The second filter is configured to direct channels having wavelengths falling within a plurality of second wavelength bands to a drop waveguide. The first filter and/or the second filter can be tunable.

Tunable add/drop node

A method of preparing an optical component for coupling with an optical fiber is disclosed. The method includes determining a thickness of a buffer layer formed on the optical component. The method also includes forming an anti reflective coating adjacent to the buffer layer. The anti reflective coating is formed to a thickness selected in response to the determined buffer layer thickness.

Efficient coupling of optical fiber to optical component

A method of forming a reflecting surface on an optical component is disclosed. The method includes forming a first mask so as to protect a ridge region of a light transmitting medium. The ridge region is a region where a ridge of a waveguide will be formed. The method also includes performing a first etch of the light transmitting medium so as to form a side of the ridge. The first mask defines a profile of the side of the ridge during the first etch. The method further includes performing a second etch of the light transmitting medium so as to form the reflecting surface. The first mask defines a profile of the reflecting surface during the second etch.

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Pasadena, CA, United States of America

Xiaoming Yin