Toyota Motor Corporation

Ilika Technologies Limited

Xiaojuan Lu

Brian Elliott Hayden

Christopher Edward Lee

Chihiro Yada

Duncan Clifford Alan Smith

Mark Stephen Beal

The present invention provides a vapour deposition process for the preparation of a phosphate compound, wherein the process comprises providing each component element of the phosphate compound as a vapour, and co-depositing the component element vapours on a common substrate, wherein the component elements react on the substrate to form the phosphate compound.

Vapour deposition process for the preparation of a phosphate compound

A vapor deposition process for the preparation of a chemical compound, wherein the process comprises providing each component element of the chemical compound as a vapor, and co-depositing the component element vapors on a common substrate, wherein: the vapor of at least one component element is provided using a cracking source; the vapor of at least one other component element is provided using a plasma source; and at least one further component element vapor is provided; wherein the component elements react on the substrate to form the chemical compound.

Vapour deposition process for the preparation of a chemical compound

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Chilworth Southampton, United Kingdom

Xiaojuan Lu