Cymer, Inc.

Kineticor, Inc.

Xiaojiang Jason Pan

John Arthur Lovberg

Alexander Igorevich Ershov

William N Partlo

Richard L Sandstrom

Jeffrey N Yu

Igor Vladimirovich Fomenkov

Richard G Morton

John Martin Algots

Palash P Das

Richard C Ujazdowski

Eckehard D Onkels

Michael Engelmann

William Herman Alameida, Jr

Richard M Ness

Thomas A Yager

John T Melchior

Stuart L Anderson

Vladimir B Fleurov

Raymond F Cybulski

James K Howey

Scot T Smith

Shahryar Rokni

Holger K Glatzel

Gerry M Blumenstock

Vladimir A Kulgeyko

Brian C Klene

Steve Grove

Daniel J W Brown

Peter Clarke Newman

Thomas Patrick Duffey

Tom A Watson

R Kyle Webb

David J Warkentin

Scott T Smith

Norbert R Bowering

Herve A Besaucele

Walter Dale Gillespie

Paul C Melcher

David Wayne Myers

I Roger Oliver

Curtis L Rettig

Ronald L Spangler

Robert A Shannon

Rodney D Simmons

Curtiss Lynn Mixon

Robert B Saethre

William N Partio

Leonard Lublin

David M Johns

Joshua C Brown

Elizabeth Marsh

John Dunlop

Firas F Putris

Nortbert Bowering

Matthew Ball

A motion tracking system for dynamic tracking of and compensation for motion of a patient during a magnetic resonance scan comprises a first camera positioned to view an optical marker along a first line of sight; a second camera positioned to view the optical marker along a second line of sight; and a computer system configured to analyze images generated by the first and second cameras to determine changes in position of the optical marker, and to generate tracking data for use by a magnetic resonance scanner to dynamically adjust scans to compensate for the changes in position of the optical marker, wherein the computer system is configured to dynamically adapt its image analysis to utilize images from all cameras that are currently viewing the optical marker.

Systems, devices, and methods for tracking and compensating for patient motion during a medical imaging scan

A system for tracking a moving target having up to six degrees of freedom and rapidly determining positions of the target, said system includes an easy to locate precision optical target fixed to the target. This system includes at least two cameras positioned so as to view the optical camera from different directions with each of the at least two cameras being adapted to record two dimensional images of the precision optical target defining precise target point. A computer processor is programmed to determine the target position of x, y and z and pitch, roll and yaw. In an embodiment, the system can be configured to utilize an iteration procedure whereby an approximate first-order solution is proposed and tested against the identified precise target points to determine residual errors which can be divided by the local derivatives with respect to each component of rotation and translation, to determine an iterative correction.

Systems, devices, and methods for tracking moving targets

A motion compensation system for tracking and compensating for patient motion during a medical imaging scan comprises an optical marker comprising an optically visible pattern and a mounting portion; a first optical detector positioned to digitally image the optically visible pattern along a first line of sight; a second optical detector positioned to digitally image the optically visible pattern along a second line of sight; a tracking engine configured to determine a pose of the object in six degrees of freedom by analyzing images from the first and second optical detectors; and a controller interface configured to generate tracking information based on the pose and to electronically transmit the tracking information to a scanner controller to enable compensation within a medical imaging scanner for object motion.

A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed with a fast angularly positionable mirror having a mirror mounting frame, a reflective optic with a coefficient different from that of the mounting frame, at least one flexure mount fromed in the mounting frame that is flexible having flexure arm attached the flexture to the mounting frame. The apparatus may include a flexure force mechanism having an elongated rod. The force mechanism may pre-stress the flexure. The mirror maybe a grating which includes a substrate with metallic layer formed on the substrate, and a protective coating made of silica formed on the reflective metallic layer. The grating maybe actively tuned using an electro- or magneto-sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge system exposed to deep ultraviolet radiation.

DUV light source optical element improvements

An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis or rotation and an ellipse in another. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members.

Discharge produced plasma EUV light source

A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.

Collector for EUV light source

The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.

Laser lithography light source with beam delivery

The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems producing a high repetition rate high power output beam. The invention includes solutions to a surface damage problem discovered by Applicants on CaFoptics located in high pulse intensity sections of the output beam of prototype laser systems. Embodiments include an enclosed and purged beam path with beam pointing control for beam delivery of billions of output laser pulses. Optical components and modules described herein are capable of controlling ultraviolet laser output pulses with wavelength less than 200 nm with average output pulse intensities greater than 1.75&#xd7;10Watts/cmand with peak intensity or greater 3.5&#xd7;10Watts/cmfor many billions of pulses as compared to prior art components and modules which failed after only a few minutes in these pulse intensities. Techniques and components are disclosed for minimizing the potential for optical damage and for reducing the pulse energy density to less than 100&#xd7;10J/cm. Important improvements described in this specification have been grouped into the following subject matter categories: (1) Solution to CaFsurface damage discovered by Applicants, (2) description of a high power ArF MOPA laser system, (3) description of beam delivery units, (4) polarization considerations (5) a high speed water-cooled auto shutter energy detector module and (6) other improvements.

High power deep ultraviolet laser with long life optics

The present invention provides a gas discharge ultraviolet laser capable of producing a high quality pulsed ultraviolet laser beam at pulse rates greater than 2000 Hz at pulse energies at 5 mJ or greater and having an enclosed beam path at least a portion of which comprises an oxidation agent. In a preferred embodiment a portion of the beam path comprises a sealed chamber containing a gas comprising a small concentration of oxygen. In one preferred embodiment the sealed chamber is an etalon chamber and the contained gas is nitrogen with an oxygen concentration of between 1.6 and 2.4 percent. In another preferred embodiments a small concentration of oxygen is added to the purge gas of a special purge compartment containing optical components exposed to high intensity output laser beam.

Gas discharge ultraviolet laser with enclosed beam path with added oxidizer

Growing community of inventors

San Diego, CA, United States of America

Xiaojiang Jason Pan