Seagate Technology Incorporated

XiaoHong Zhang

Wei Tian

Yi Liu

Kirill A Rivkin

Joseph Mundenar

Dong Lin

Dan Yu

Aaron Michael Bowser

Zhe Shen

Jia Sun

A write head including a bearing surface and a write pole having a front surface that forms a portion of the bearing surface. The front surface has a leading edge, a trailing edge and side edges connecting the leading and trailing edges. The write head also includes side shields proximate to the side edges of the write pole, and a trailing shield over the write pole and the side shields. A trailing shield-write pole gap is present between the trailing edge and the trailing shield, and a trailing shield-side shield gap is present between the trailing shield and the side shields. The trailing shield-shield shield gap is substantially less than the trailing shield-write pole gap.

Write head with reduced side to trailing shield spacing

A write head including a bearing surface and a write pole having a front surface that forms a portion of the bearing surface. The front surface has a leading edge, a trailing edge and side edges connecting the leading and trailing edges. The write head also includes side shields proximate to the side edges of the write pole, and a trailing shield over the write pole and the side shields. A trailing shield-write pole gap is present between the trailing edge and the trailing shield, and a trailing shield-side shield gap is present between the trailing shield and the side shields. The trailing shield side shield gap is substantially less than the trailing shield-write pole gap.

Write head with reduced trailing shield&#x2014;side shield spacing

Implementations disclosed herein provide a method of reducing the topography at the alignment and overlay marks area during the writer pole photolithography process in order to reduce the wafer scale variation and reduce the writer pole photolithography process rework rate. In one implementation, an intermediate stage of a wafer for writer pole formation is generated by removing a part of at least one metallic writer pole layer on top of an intermediate stage writer pole wafer to form a recovery trench, depositing an optically transparent material on top of the wafer, wherein the thickness of the optically transparent material is higher than a target recovery trench topography, forming a photoresist pattern on top of the optically transparent material over the recovery trench, etching the optically transparent material, and removing the photoresist pattern and at least part of the remaining optically transparent material.

Writer pole formation

Implementations disclosed herein provide an apparatus comprising a write pole, and a two-layer front shield formed on the write pole, the front shield comprising, a first dielectric material formed on the first layer of the front shield, an active shield control (ASC) device formed between the two layers of the front shield on the first dielectric material configured to synchronize the response to a magnetomotive force (MMF) of a write pole and the front shield, and a second dielectric material formed on the ASC device, wherein the second layer of the front shield is formed only on top of the second dielectric material and the first layer of the front shield.

Magnetic recording head front shield formation

A data writer can be fabricated by constructing a write pole to continuously extend from an air bearing surface prior to depositing a first gap layer to continuously extend from the ABS in contact with a first write pole sidewall. A first side shield protrusion can then be formed on the air bearing surface to be separated from the write pole by the first gap layer. A second gap layer may be deposited to continuously extend from the first side shield protrusion along the first write pole sidewall to define a dielectric region on which a second side shield protrusion is formed with the second side shield protrusion separated from the write pole by the first and second gap layers and the first and second side shield protrusions each cantilevered from a common side shield body.

Growing community of inventors

Eden Prairie, MN, United States of America

XiaoHong Zhang