Chengdu Boe Optoelectronics Technology Co., Ltd.

Boe Technology Group Co., Ltd.

Beijing Boe Technology Development Co., Ltd.

Xiaodan Wei

Xingqiang Zhang

Dongkoog Jang

Wei Zhao

Zhong Lu

Chao Ye

Xiaofeng Yang

Shuibin Ni

Yi Peng

Hongxu Yan

Chuan Huang

Xiaoyu Xing

A touch-controlling region of a touch-controlling base plate includes a touch-controlling layer; a non-touch-controlling region includes a plurality of lead wires and at least one touch-controlling unit; the touch-controlling layer includes a plurality of first electrically conductive units and a plurality of second electrically conductive units; the touch-controlling unit is located on at least a first side of the touch-controlling layer; the lead wires are connected to the touch-controlling unit, and are located on a same one side of the touch-controlling layer; and a plurality of lines of the first electrically conductive units that are arranged in the first channel direction are grouped into two groups, and at least one of the groups is connected to the lead wires via each line of the first electrically conductive units that are located at an edge of the first side of the touch-controlling layer.

Touch-controlling base plate and displaying device

A method for fabricating an array substrate, an array substrate and a display device are provided. The method for fabricating the array substrate includes: forming a spacer layer on the array substrate, the spacer layer is disposed under a planarized layer and corresponds to a location of a via hole in the planarized layer, wherein the planarized layer is formed of a hot melt material.

Method for fabricating array substrate, array substrate and display device

The method for manufacturing the TFT includes: forming a semiconductor film, a doped semiconductor film, a source/drain electrode film, and a first patterned photoresist layer sequentially; performing first etching to remove the source/drain electrode film on a region that is not covered by the first patterned photoresist layer; performing second etching to remove the doped semiconductor film and the semiconductor film on a region that is not covered by the first patterned photoresist layer; performing ashing treatment on the photoresist layer to remove the photoresist layer on the channel region; hard-baking the photoresist layer after the ashing treatment; performing third etching to remove the source/drain electrode film on a region that is not covered by the photoresist layer; and performing fourth etching to remove the doped semiconductor film on the region that is not covered by the photoresist layer.

Method for system for manufacturing TFT, TFT, and array substrate

The general inventive concepts relate to the field of display technology, and provide a mask plate and a method for producing a substrate mark to increase the accuracy of the production of a substrate mark, and decrease the difficulty in monitoring products and the production cost. An exemplary mask plate comprises: a display region mask part; at least one pair of test mark mask parts, a test mark mask part being located on either side of the display region mask part and their positions being opposite to each other; and a protection mark mask part correspondingly disposed on the outside of each test mark mask part relative to the display region mask part, wherein the pattern outline of the protection mark mask part is larger than that of the test mark mask part.

Mask plate and a method for producing a substrate mark

Growing community of inventors

Beijing, China

Xiaodan Wei