Boe Technology Group Co., Ltd.

Beijing Boe Display Technology Co., Ltd.

Beijing Boe Optoelectronics Technology Co., Ltd.

Boe Technology Groupco., Ltd.

Xiangqian Ding

Jinchao Bai

Yao Liu

Yongzhi Song

Xiaoxiang Zhang

Liangliang Li

Zongjie Guo

Yihe Jia

Lianjie Yang

Huibin Guo

Xiaowei Liu

Mingxuan Liu

Hao Han

Xiaolong Li

Jing Wang

Xi Chen

Xiao Han

Zumou Wu

Honggang Liang

Yan Pang

Xiangmeng Zhang

Jiantao Liu

Zheng Liu

Jing Liu

Liang Sun

Tsungchieh Kuo

Zhichao Zhang

Xun Wang

Honghui Wang

Fangbin Fu

Tianyu Zuo

Hongming Qu

The present disclosure provides an array substrate, a method for manufacturing the array substrate, and a display apparatus. The array substrate includes: a base substrate, a thin film transistor disposed on the base substrate; a first passivation layer, an organic film layer and a pixel electrode disposed on the thin film transistor; a connection structure for connecting the source electrode of the thin film transistor and the pixel electrode, wherein the connection structure is disposed in a via hole structure exposing the pixel electrode and the source electrode; or, the connection structure is disposed between the pixel electrode and the source electrode.

Array substrate and display apparatus comprising connection structure between pixel electrode and source electrode

The present disclosure provides a display substrate, a method for preparing the same, and a flexible display device, and belongs to the technical field of display. Among them, the display substrate includes: a base substrate; a metal pattern located on the base substrate, and an anti-reflection pattern located on a surface of the metal pattern proximate to the base substrate; in which a material of the anti-reflection pattern includes molybdenum oxide doped with a refractory metal, and a melting point of the refractory metal is greater than a temperature threshold. The technical solution of the present disclosure is capable of reducing the reflection of ambient light by the display substrate.

Display substrate and method for preparing the same, and display device

Provided is a display substrate, a manufacturing method thereof and a display panel. The display substrate includes a base substrate, a display region and a bonding region located at a side of the display region on the base substrate, wherein the bonding region includes a first protective layer and a bonding electrode disposed on the base substrate; the first protective layer is provided with a groove; the bonding electrode is at least partially disposed in the groove; in a direction parallel to the base substrate, the groove, the bonding electrode and the first protective layer extend to an edge of the bonding region in a direction away from the display region; and a material of the first protective layer is less hard than a material of the bonding electrode.

Display substrate and manufacturing method thereof, and display panel

An array substrate includes a base, at least one common electrode, at least one signal line and at least one conductive connecting line. The at least one common electrode is formed on the base, and a signal line arranged correspondingly to each of the at least one common electrode is formed on the base. The signal line includes a light absorbing layer and a metal layer that are stacked in a direction away from the base. Conductivity of the light absorbing layer is less than conductivity of molybdenum. Each of the at least one conductive connecting line is electrically connected to both a common electrode and a metal layer in the corresponding signal line.

Array substrate and method of manufacturing the same, and display device

An array substrate, a display, and a manufacturing method are provided. The array substrate is provided with a first notch on at least one of two sides in a width direction of the second fan-out line, wherein a portion of the insulating layer fills into the first notch in a direction towards the second fan-out line to form a recess part corresponding to the first notch, the recess part defining a groove. A protruding part is provided on at least one of two sides in a width direction of the first fan-out line, where a part of the protruding part fills into the groove in a direction towards the insulation layer to form a protrusion corresponding to the groove.

Array substrate, manufacturing method thereof, and display

The present disclosure relates to a flexible temperature sensor, a method for preparing the same, and a flexible device. The flexible temperature sensor includes: a flexible substrate; an electrode arranged on the flexible substrate; a mixed fluid arranged on the flexible substrate and in contact with the electrode, in which the mixed fluid includes an ionic liquid and porous conductive particles; and a protective plate arranged on a surface of the flexible substrate having the mixed fluid to protect the mixed fluid.

Flexible temperature sensor, method for preparing the same and flexible device

The preset disclosure provides an array substrate and a method for manufacturing the same, a display panel and a display device. The array substrate includes: a base substrate; data lines and pixel electrodes located on the base substrate, and a light shielding structure located on a side of the data lines close to the base substrate, orthographic projections of the gaps on the base substrate are located within an orthographic projection of the light shielding structure on the base substrate, and the light shielding structure includes a metal layer and a first transparent layer located on a side of the metal layer away from the base substrate.

Array substrate and method for manufacturing the same, display panel, and display device

The present disclosure provides a display substrate, a method for preparing the same, and a display device. The display substrate includes: a base substrate; a metal pattern located on the base substrate, and an anti-reflection pattern located on a surface of the metal pattern proximate to the base substrate, in which a difference between a first slope angle of the anti-reflection pattern and a second slope angle of the metal pattern is less than a first threshold, and a distance between a first edge of a side surface of the anti-reflection pattern proximate to the metal pattern and a second edge of a side surface of the metal pattern proximate to the anti-reflection pattern is less than a second threshold.

This disclosure provides an array substrate, a method for fabricating the same, a display panel, and a display device, where a first photo-resist layer is stripped in a changed order in that the first photo-resist layer on a source-drain is stripped through wet etching before a ohm contact layer film and an active layer film are etched in an electrically-conductive channel area (i.e., an electrically-conductive channel of a TFT is etched) to form an ohm contact layer and an active layer.

Method for preparing array substrate by stripping first photo-resist layer through wet etching before forming ohm contact layer and active layer

The present disclosure relates to a display panel. The display panel may include an OILED device and a package structure on the OLED device. The package structure may include a first water-oxygen absorbing layer comprising a first water-oxygen absorbing material. The first water-oxygen absorbing material may include first transition metal nanoparticles and a first metal organic framework coated on a surface of the first transition metal nanoparticles.

Display panel and preparation method thereof

An array substrate motherboard, a manufacturing method thereof and a display device are provided. The manufacturing method includes forming a film layer pattern for a first display product at a first region of a base substrate and forming a film layer pattern for a second display product at a second region of the base substrate. The first display product has deep holes at a density larger than the second display product, and each deep hole is a via-hole penetrating through at least two insulation layers. Specifically, the manufacturing method include: prior to forming a second conductive pattern on an insulation layer, reducing a thickness of the insulation layer at the first region; and forming the second conductive pattern on the insulation layer, and enabling the second conductive pattern to be connected to a first conductive pattern under the insulation layer through a via-hole structure penetrating through the insulation layer.

Method for manufacturing an array substrate motherboard

An array substrate, a testing method and a manufacturing method of the array substrate are disclosed. The array substrate comprises a first test line (), a second test line (), and first data lines () and second data lines () that are disposed alternately. The first data lines () are directly connected to the first test line (), and the second data lines () are connected to the second test line () through switch elements (); or, the second data lines () are directly connected to the second test line (), and the first data lines () are connected to the first test line () through switch elements (). With the array substrate, charges in the display region can be avoided from being transferred to a test line, thereby decreasing the accumulation of static electricity, and enhancing reliability of the short bar region.

Array substrate and testing method and manufacturing method thereof

Disclosed is an array substrate including a base substrate and a gate metal layer, a semiconductor layer, a source-drain metal layer, and a pixel electrode layer that are formed on the base substrate. The gate metal layer includes gate lines, gate electrodes of thin film transistors, and a plurality of first sensing lines extending along a row direction. The semiconductor layer includes an active layer of the thin film transistors, and a plurality of first photosensitive elements and a plurality of second photosensitive elements that are insulated from each other. The source-drain metal layer includes data lines, source electrodes and drain electrodes of the thin film transistors, and a plurality of second sensing lines extending along a column direction. Also disclosed are a method of fabricating the array substrate, an optical touch screen and a display device.

Array substrate and fabrication method thereof, optical touch screen, and display device

The present application discloses A thin film transistor (TFT), including: a substrate; a source-drain layer comprising a source electrode and a drain electrode over the substrate; and an active layer comprising a poly-Si pattern and an amorphous-Si pattern having contact with the poly-Si pattern over the substrate. The amorphous-Si pattern is between the poly-Si pattern and the source-drain layer; the source electrode overlaps with the poly-Si pattern and the amorphous-Si pattern respectively in a direction substantially perpendicular to a surface of the substrate; and the drain electrode overlaps with the poly-Si pattern and the amorphous-Si pattern respectively in the direction substantially perpendicular to the surface of the substrate.

Thin film transistor, array substrate, and display apparatus, and fabrication methods thereof

An array substrate and manufacturing method thereof and display device are provided. The method of manufacturing the array substrate includes forming a pattern including a gate electrode, a gate line, a common electrode line and a gate insulating layer on a substrate; forming a pattern including a data line, a source electrode, a drain electrode and an active layer; forming a pattern including an insulating interlayer over the pattern of the source electrode, the drain electrode and the active layer; forming a pattern including a first transparent electrode over the insulating interlayer; forming a pattern including a passivation layer over the first transparent electrode; and forming a pattern including a second transparent electrode over the passivation layer. The method can efficiently prevent the ITO process polluting the TFT channel.

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Beijing, China

Xiangqian Ding