Wisconsin Alumni Research Foundation

Flexterra, Inc.

Polyera Corporation

Xiang Yu

Antonio Facchetti

Padma Gopalan

Myungwoong Kim

Daniel Patrick Sweat

Darwin Scott Bull

Shaofeng Lu

Yu Xia

Zhikai Wang

Chun Huang

Theresa L Starck

Meko McCray

Karen K Chan

Block copolymers for use in block copolymer lithography, self-assembled films of the block copolymers and methods for polymerizing the block copolymers are provided. The block copolymers are characterized by high Flory-Huggins interaction parameters (&#x3c7;). The block copolymers can be polymerized from protected hydroxystyrene monomers or from tert-butyl styrene and 2-vinylpyridine monomers.

Block copolymers with high flory-huggins interaction parameters for block copolymer lithography

The present teachings relate to curable linear polymers that can be used as active and/or passive organic materials in various electronic, optical, and optoelectronic devices. In some embodiments, the device can include an organic semiconductor layer and a dielectric layer prepared from such curable linear polymers. In some embodiments, the device can include a passivation layer prepared from the linear polymers described herein. The present linear polymers can be solution-processed, then cured thermally (particularly, at relatively low temperatures) and/or photochemically into various thin film materials with desirable properties.

Curable polymeric materials and their use for fabricating electronic devices

Block copolymers with high Flory-Huggins interaction parameters for block copolymer lithography

Described herein is a solution-processable composition for preparing a photopatternable material. The solution-processable composition generally includes (a) an oligomeric siloxane component that includes, based on its total weight, between about 40% by weight and about 100% by weight one or more cage-structured polyhedral oligomeric silsesquioxanes that are functionalized with one or more crosslinkable moieties such as cycloaliphatic epoxy moieties, (b) a polymerization initiator; (c) one or more thermosettable polymers that collectively are present in an amount between about 1% by weight and about 20% by weight based on the total weight of the oligomeric siloxane component; and (d) a solvent.

Photopatternable materials and related electronic devices and methods

Growing community of inventors

Skokie, IL, United States of America

Xiang Yu