Other

Irresistible Materials, Ltd

Xiang Xue

Andreas Frommhold

Dongxu Yang

Edward A Jackson

Thomas A Lada

John L Roth

Alex Philip Graham Robinson

Alex Phillip Graham Robinson

Jon Andrew Preece

Alexandra McClelland

Richard Edward Palmer

Drew Athans

The present application for patent discloses a composition of matter comprising: comprising a solvent; and an ester having a chemical structure chosen from (I), (II), or (III); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein Ris a saturated or unsaturated group having from 1-4 carbon atoms, Ris chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, Ris a saturated or unsaturated group having from 1-4 carbon atoms, and Ris a saturated or unsaturated group having from 1-4 carbon atoms and Ais an anion.

Composition of matter and molecular resist made therefrom

The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.

Methanofullerenes

Disclosed and claimed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein Ris a saturated or unsaturated group having from 1-4 carbon atoms, Ris chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, Ris a saturated or unsaturated group having from 1-4 carbon atoms, and Ris a saturated or unsaturated group having from 1-4 carbon atoms.

Disclosed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); at least one photo acid generator; at least one crosslinker; and at least one solvent; wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein Ris a saturated or unsaturated group having from 1-4 carbon atoms, Ris chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, Ris a saturated or unsaturated group having from 1-4 carbon atoms, and Ris a saturated or unsaturated group having from 1-4 carbon atoms.

Growing community of inventors

Winchester, MA, United States of America

Xiang Xue