Commissariat &#xc0; L'&#xc9;nergie Atomique Et Aux &#xc9;nergies Alternatives

Ulis

Lynred

Xavier Zucchi

Denis Pelenc

Abdelkader Aliane

Claire Vialle

Valerie Goudon

Sébastien Cortial

Marc Guillaumont

Valérie Goudon

Sebastien Cortial

A microbolometer may include a sensitive material based on vanadium oxide (VO) with an additional chemical element such as boron (B), but excluding nitrogen (N), the sensitive material wherein the sensitive material (i) is amorphous, (ii) has an electrical resistivity at ambient temperature in a range of from 1 to 30 &#x3a9;&#xb7;cm, (ii) has a homogeneous chemical composition, and (iv) has an amount of boron, defined as a ratio of a number of boron to vanadium atoms to that of vanadium, at least equal to 0.086.

Process for manufacturing a microbolometer containing vanadium oxide-based sensitive material

An infrared radiation detector includes an array of elementary imaging bolometric detectors, each of the elementary bolometric detectors being formed of a bolometric membrane including a film made of vanadium oxide VOx, having a resistivity in the range from 6 ohm&#xb7;cm to 50 ohm&#xb7;cm, said membrane being suspended above a substrate integrating a signal for reading out the signal generated by said elementary detectors and for sequentially addressing the elementary detectors. The detector includes at least one getter intended to ensure the trapping of residual gas during and after the forming of the detector, and includes a hermetically-sealed cavity having said array and said at least one getter housed therein, having an upper cap including a window transparent to infrared radiation, said cap being sealed by means of a seal on a chip supporting the array of elementary detectors or on a package at the bottom of which the chip supporting the array of elementary detectors has been attached, said cavity being under vacuum or a low pressure.

Detector of electromagnetic radiation and in particular infrared radiation, and process for producing said detector

The invention relates to a process for manufacturing a microbolometer () comprising a sensitive material () based on vanadium oxide (VO) comprising an additional chemical element chosen from among boron (B), carbon (C), with the exception of nitrogen (N), comprising the following steps:

A process for manufacturing at least one microbolometer comprising a sensitive material based on vanadium oxide containing nitrogen as additional chemical element, includes steps of determining a non-zero effective amount of the additional chemical element starting from which the sensitive material, having undergone a step of exposure to a temperature Tfor a duration &#x394;t, has an electrical resistivity &#x3c1;at ambient temperature greater than or equal to 50% of the native value &#x3c1;of said sensitive material at ambient temperature; producing the sensitive material in a thin layer having an amount of the additional chemical element greater than or equal to the effective amount determined beforehand, the sensitive material being amorphous and having an electrical resistivity of between 1 and 30 &#x3a9;&#xb7;cm; and exposing the sensitive material to a temperature Tfor a duration &#x394;t.

Growing community of inventors

Grenoble, France

Xavier Zucchi