Imagine Optic

Imagine Eyes

Centre National De La Recherche Scientifique

Essilor International

Universitë De Bordeaux

Essilor International (compagnie General D'optique)

Amplitude Technologies

Image Optic

Xavier Levecq

Fabrice Harms

Samuel Henri Bucourt

Nicolas Lefaudeux

Guillaume Dovillaire

Fabien Divo

Vincent Studer

Laurent Guillermin

Sylvain Chene

Jean-Baptiste Sibarita

Virgile Viasnoff

Rémi Galland

Gilles Riboulet

Guillaume Gorju

Adam Ayeb

Jordi Andilla

Barbara Lamory

Fahem Boudries

A method for controlling alignment of an eye in an ophthalmological imaging device that includes a formation, on a two-dimensional detection plane, of an image of an element located in a plane of the pupil of the eye using an imaging optical element. The method further includes a determination of a lateral position of the pupil of the eye with respect to a point of origin of a reference frame of an imaging system in the eye space based on the position of the image in the detection plane. The method further includes an analysis of a state of focus of the image in two regions of the detection plane. The method further includes a determination of an axial position of the pupil of the eye with respect to the point of origin of the reference frame based on the analysis of the state of focus.

Methods and systems for inspecting the alignment of the eye in an ophthalmological imaging apparatus

According to one aspect, the present description relates to a device for analysing a wavefront, configured to be connected to a fluorescence microscopy imaging system with optical sectioning, equipped with a microscope objective comprising a pupil in a pupil plane, the analysis device comprising a two-dimensional detector comprising a detection plane; a two-dimensional arrangement of microlenses, arranged in an analysis plane, each microlens being configured to form, on the detection plane, when the analysis device is connected to the microscopic imaging system, an image of an object situated in a focal plane of the microscope objective, with a given analysis field; an optical relay system configured to optically conjugate the analysis plane and the pupil plane; a field diaphragm positioned in a plane optically conjugated with the plane of detection, and configured to define said analysis field; a processing unit configured to determine, based on the set of images formed by the microlenses, a two-dimensional map of a characteristic parameter of the wavefront in said analysis plane.

Device for wavefront analysis and microscopic imaging systems comprising such analysis devices

A device for analysing a wavefront may be connected to a fluorescence microscopy imaging system with optical sectioning, equipped with a microscope objective including a pupil in a pupil plane, the analysis device including a two-dimensional detector including a detection plane; a two-dimensional arrangement of microlenses, arranged in an analysis plane, each microlens forming, on the detection plane, when the analysis device is connected to the microscopic imaging system, an image of an object situated in a focal plane of the microscope objective, with a given analysis field; an optical relay system optically conjugating the analysis plane and the pupil plane; a field diaphragm positioned in a plane optically conjugated with the plane of detection, and defining said analysis field; a processing unit that determines, based on the set of images formed by the microlenses, a two-dimensional map of a characteristic parameter of the wavefront in said analysis plane.

The present description relates, according to one aspect, to a high-peak-power laser pulse generation system (), comprising at least one first light source () for emitting first laser pulses (I), a fiber device () for transporting said first laser pulses, comprising at least one first multimode fiber with a single core designed to receive said first laser pulses, and a module () for temporally shaping said first laser pulses, arranged upstream of the fiber device, configured so as to reduce the power spectral density of said pulses by reducing the temporal coherence.

Methods and systems for generating high peak power laser pulses

The multi-scale scanning imaging system () of the retina comprises according to an example a lighting and detection module () configured for emitting a lighting beam and for detecting a beam reemitted by the retina, a first scanning module () of the lighting beam and the reemitted beam, a first optical path, referred to as a 'wide field' path, and a second optical path, referred to as a “small field” path, for focusing the lighting beam on the retina and for receiving the beam reemitted by the retina. The “wide field” path comprises a first optical system () configured to conjugate a plane located near a plane of rotation of the scanning module and the plane () of the entrance pupil of the eye (). The “small field” path comprises a wavefront correction device (), a second optical system () configured to conjugate a plane located near a plane of rotation of the at least one first scanning module and the effective surface of the wavefront correction device, a third optical system, comprising at least part of the first optical system, configured to conjugate said effective surface () of the correction device and the plane of the entrance pupil of the eye. The multi-scale scanning imaging system further comprises a first optical deflection element () configured to send the beam reemitted by the retina on one and/or the other of the first and second imaging paths and intended to be positioned on the first imaging path, between the common part () of the first and third optical systems and the scanning module (), and on the second imaging path, between the common part of the first and third optical systems and the wavefront correction device.

System and method for multi-scale retinal imaging

A method for evaluating the quality of the measurement of an optical wavefront, said measurement being obtained by means of a wavefront analyzer by direct measurement, the method comprising:

Method for evaluating the quality of the measurement of a wavefront and systems implementing such a method

The invention concerns, in one aspect, an actuator for generating a bidirectional force intended for being integrated into a deformable mirror comprising a deformable reflective substrate. Said actuator comprises a stationary body (); a drive device; a drive rod () able to be driven in a translatory movement with respect to the stationary body (), along an axis of translation (xx'), by means of the drive device; a floating head () designed to be attached to the deformable reflective substrate, and mounted in floating manner with respect to the drive rod via first and second elastic means (). The first and second elastic means () are each mounted between the drive rod () and the floating head () and are designed to apply forces to the floating head, whose projections on the translation axis (xx&#x2032;) are of opposite directions.

Electromechanical actuator for deformable mirror

According to one aspect, the invention concerns a method for microscopy of a thick sample arranged on a sample support, with edge-illumination of the sample. The method comprises, in particular, emitting at least one illumination beam (), forming, from the illumination beam, an illumination surface, focusing the illumination surface in the sample by means of a microscope lens () and deflecting the illumination surface originating from the microscope lens, in order to form a transverse illumination surface, located in a plane substantially perpendicular to the optical axis of the microscope lens. The method further comprises forming, by means of said microscope lens (), the image of an area of the sample illuminated by the transverse illumination surface on a detection surface () of a detection device (), scanning the illumination beam, allowing the transverse illumination surface to move along the optical axis of the microscope lens, and superimposing the object imaging surface and the transverse illumination surface, by focusing means comprising means separate from the means for the relative axial movement of the microscope lens and the sample.

System and method of edge-illumination microscopy

The invention relates to a high-resolution retinal imaging method and device notably comprising an emission source (LSr) for emitting a light beam for the illumination of the retina of an eye () of a subject, a detection device () capable of detecting spatial-frequency structures of 250 cycles/mm measured in the plane of the retina, an optical imaging system () allowing for the formation of an image of at least a part of the retina on the detection device (), a device () for measuring optical defects with an analysis plane of the optical defects, a correction device () comprising a correction plane and intended to correct, in said correction plane, the light rays from said emission source (LSr) and backscattered by the retina as a function of the optical defects measured by the measurement device (). The correction and analysis planes are optically conjugated with a predetermined plane () of the eye, and the input pupil of said optical imaging system has a diameter of between a first value &#x3a6;min and a second value &#x3a6;max, the first value being defined to allow for the detection by said detection device (), at an imaging wavelength, of structures of the retina exhibiting a spatial frequency of 250 cycles per millimeter, and the second value being less than 5.75 mm.

Method and device for high-resolution retinal imaging

A super-resolution microscopy method includes forming an image of an emitting particle in a detection plane of a detector by a microscopy imaging system and correcting, by a wavefront-modulating device, at least some of the optical defects present between the emitting particle and the detection plane. The method further includes introducing, via the wavefront-modulating device, a deformation of the wavefront emitted by the emitting particle, of variable amplitude, allowing a bijective relationship to be formed between the shape of the image of the emitting particle in the detection plane and the axial position of the emitting particle relative to an object plane that is optically conjugated with the detection plane by the microscopy imaging system. The method further includes controlling the amplitude of the deformation of the wavefront by controlling the wavefront-modulating device, as a function of the given range of values of the axial position of the particle.

Method and optical device for super-resolution localization of a particle

Methods and devices for reducing the dimensions of an incident light beam of large dimensions are disclosed. The method includes the dispatching of a first light beam toward a partially reflecting plate of dimensions suitable for the dimensions of the light beam of large dimensions, the dispatching onto a convergent reflective element of a second light beam arising from the transmission through the partially reflecting plate of the first light beam, the dispatching of a third light beam arising from the reflection on the convergent reflective element of the second light beam, toward said partially reflecting plate, and the reflection of the third beam on the partially reflecting plate so as to form a fourth light beam.

Methods and devices for controlling the size of light beams of large dimensions

The invention relates, according to one aspect, to a retinal imaging device including at least one source (LS, LS) for emitting a light beam in order to illuminate the retina of an eye () of a subject, a retinal imaging path including a detection device () having a detection plane () and an optical imaging system (L, L, L), an analysis path including a device () for measuring optical defects having an analysis plane () for receiving a set of light rays backscattered by the retina and optical means for adjoining said analysis plane and a predetermined plane in the input space of said imaging system of the imaging path, a correction device () shared by said analysis and imaging paths, which includes a correction plane () and which is intended to correct, in said correction plane, the light rays from said emission source and backscattered by the retina according to the optical defects measured by the device for measuring optical defects. The retinal imaging device further includes a light blackout system (), which is positioned in an adjacent plane or which coincides with said correction plane, or which is positioned in an image plane of said correction plane located on an optical path shared by the analysis and imaging paths, and which is sized so as to at least partially black out the reflections of the light rays from said emission source by the corneal surface.

Method for shielding a high-power laser apparatus (S) in which a laser beam is generated and then amplified in at least a first amplification stage, including spatial filtering () of the amplified laser beam, phase correction () carried out on the laser beam before it is spatially filtered, and a measurement of the aberrations () on the laser beam. The phase of the beam is corrected so as to produce a beam having minimal aberrations after spatial filtering. The shielding device (D, D') implementing this method may in particular be employed in apparatus using an intense laser beam of high (terawatt) peak power and in proton therapy units.

Method and device for shielding a high-power laser apparatus and high-power-laser optical system employing such a device

A method for correcting a wave front analyzer, in which the analyzer detects a signal from an incident wave front to be analyzed (FO), the detected signal providing phase and intensity local information. The method includes correcting the phase computation according to intensity space variations. A wave front analyzer for implementing the method is also described.

Method for correcting a wave front analyser and analyser implementing said method

An instrument () for characterizing an optical system, includes: at least one primary source () for emitting an illumination light beam (FE); an optical device for directing the illumination beam (FE) onto the optical system (L) to be characterized; a wave front analyzer () adapted for receiving a beam from the optical system (L); and a unit for processing the measure signals from the wave front analyzer (), adapted for providing characterization information of the optical system (L). The instrument further includes a scattering member () substantially provided in the focal plane of the optical system (L) so as to create a secondary source generating a secondary beam flowing through the optical system (L) and further directed towards the wave front analyzer.

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Gif sur Yvette, France

Xavier Levecq