Boe Technology Group Co., Ltd.

Beijing Boe Optoelectronics Technology Co., Ltd.

Wukun Dai

Zhilong Peng

Lei Chen

Huanping Liu

Lei Zhang

Jiapeng Li

Yang An

Miao Qiu

Wei Wang

Fengguo Wang

Yuguang Fan

Yiping Dong

Ziqi Xia

Shenghui Wang

Dengguo Xia

Anjia Yang

Xiuhong Jin

There are provided an array substrate, a display panel and a display device. The array substrate includes a display area and a non-display area. The non-display area include: at least one first wiring configured to be connected with a signal line within the display area and with a driver integrated circuit disposed within the non-display area; and at least one second wiring configured to cause photoresist to be uniformly distributed during a spin coating process of the photoresist.

Array substrate, display panel and display device

An overlay alignment detection apparatus for a display device and an exposure process system are provided, the overlay alignment detection apparatus including a bearing frame for bearing the display device, a control circuit, a detection assembly and an analysis circuit. The control circuit is to send control commands to the detection assembly depending on pre-stored coordinate information of a reference point within an overlay area of the display device in response to the bearing frame being at an idle time among processes; the detection assembly is to be moved to the overlay area on the bearing frame according to the control commands sent by the control circuit, to acquire images of the overlay area, and to send the acquired images to the analysis circuit; and the analysis circuit is to analyze and process an overlay alignment condition of the display device, with the images sent by the detection assembly.

Overlay alignment detection apparatus for display device and exposure process system

The present disclosure provides a method for manufacturing a slit electrode, the slit electrode, and a display panel. The method includes steps of forming a first photoresist pattern on a passivation layer, the first photoresist pattern being of a shape identical to a slit of the slit electrode, forming a slit electrode pattern on the passivation layer with the first photoresist pattern, the slit electrode pattern being covering with a second photoresist pattern which has a shape identical to the slit electrode; and removing the first photoresist pattern and the second photoresist pattern.

Method for manufacturing slit electrode, slit electrode, and display panel

An embodiment of the present disclosure discloses an array substrate, including a base substrate, a drain electrode of a thin film transistor and a pixel electrode corresponding to the drain electrode arranged on the base substrate, wherein the pixel electrode and the drain electrode are attached to each other.

Array substrate and manufacturing method thereof, liquid crystal panel and liquid crystal display device

The present disclosure provides a method for producing a TFT array substrate, a TFT array substrate, and a display apparatus, and relates to a technical field of display. It can solve a problem of no signal transmission caused by fracture of a source signal line, without increasing a coupling capacitance of the TFT array substrate. The method for producing a TFT array substrate includes: forming a transparent conductive layer and a source-drain metal layer in sequence onto a base substrate; and patterning the source-drain metal layer and the transparent conductive layer in one patterning process to form a source signal line and a pixel electrode line overlapping with each other.

Method for producing TFT array substrate, TFT array substrate, and display apparatus

The present disclosure provides an array substrate and a method of manufacturing the same, and a display device. TA connecting portion is provided within the overlapping region between the first signal line and the second signal line, is electrically conductive and directly contacts the second signal line. Thus, even when the upper second signal line is broken due to the large step difference within the overlapping region between the first signal line and the second signal line, the connecting portion electrically connected with the broken second signal line can still electrically connect and conduct the broken second signal line, thereby avoiding transmission of signal from being adversely affected by the broken signal line within the overlapping region.

Array substrate and method of manufacturing the same, and display device

A display panel and a method for manufacturing the same and a display device are disclosed, the display panel comprises an array substrate () and a cell-assembled substrate () arranged oppositely to the array substrate (), spacers spaced from each other are arranged between the array substrate () and the cell-assembled substrate (), the spacers comprise a plurality of primary spacers (); and M, in number, of the primary spacers () are provided per unit area in a peripheral region of the display panel, N, in number, of the primary spacers () are provided per unit area in a central region of the display panel, and M is greater than (&#x3e;) N. The display panel can avoid the breakage of the spacers in the peripheral region of the display panel or the breakage of the orientation layer on the spacers.

Display panel with primary spacer and secondary spacer and method for manufacturing the same and display device

The present invention relates to a pixel structure and a manufacturing method thereof, a display panel and a display device. The pixel structure comprises a plurality of columns of pixels, a data line is provided between every two adjacent columns of pixels, each pixel comprises a pixel electrode and a thin film transistor comprising a gate, an active layer, a source and a drain, wherein, a gate protective layer is provided between the gates and the active layers, grooves, each of which is at least partially located between two adjacent columns of pixels, are provided in the gate protective layer, for opposite ends of the pixel electrodes of the two adjacent columns of pixels and the data line between the two adjacent columns of pixels, one is located in the groove, and the other is located on a part of the gate protective layer without the groove.

Pixel structure and manufacturing method thereof, display panel and display device

The present disclosure relates to the field of display technology, and provides an array substrate, its manufacturing method and a display device. A signal line on the array substrate includes at least two conductive layers electrically connected to each other. When one of the conductive layers is broken, a signal may be transmitted through the other conductive layer(s). As a result, it is able to improve the reliability of the electrical connection of the signal line, thereby to improve the yield of the display device. Further, the plurality of conductive layers of the signal line is formed simultaneously in an existing process for manufacturing the conductive layer patterns for the array substrate, so it is unnecessary to form the signal line separately, and thereby the manufacturing process is simplified.

Array substrate, its manufacturing method and display device

The invention provides a display motherboard, a display panel and a display device for solving the problem of unsmooth cutting of the display motherboard in the prior art during cutting. In the display motherboard, the display panel and the display device provided by the present invention, a cutting area of the display motherboard is provided with a raised portion on one side close to sealant, and the raised portion can make the cutting stress more concentrated when the display motherboard is cut, so that adhesion of the sealant to substrates is reduced and thus the display motherboard is cut more smoothly.

Display motherboard, display panel and display device

A surface planarization method of thin film and a preparing method of an array substrate relate to a display field, and can solve the technical problem that the conventional dry etching severely damages the surface flatness of other film layers below the one being etched, thereby improving the display properties of the LCD. The preparing method of the array substrate comprises patterning a non-metallic layer () by a dry etching. And following the step of patterning a non-metallic layer () by the dry etching, the method further comprises performing surface planarization on a first film layer () to recover the first film layer () with a rough surface caused by the dry etching to be planar. The first film layer () is located below the non-metallic layer ().

Growing community of inventors

Beijing, China

Wukun Dai