Taiwan Semiconductor Manufacturing Comp. Ltd.

Wu-Han Jiang

Hom-Chung Lin

Chi-Fu Yu

Song-Yueha Lin

Hu-Li Sun

An apparatus and a method for detecting the tilt angle of a wafer platform in a process machine, particularly in a medium density ion implanter. The apparatus and method can be used to accurately calibrate the zero-angle position of a wafer platform in the medium energy ion implanter. The apparatus includes a process chamber that has a cavity and a wafer platform therein, a window that is substantially transparent to laser energy mounted in a top wall of the chamber, and a laser emitter and receiver positioned outside the process chamber juxtaposed to the window for emitting a laser beam onto a wafer positioned on the wafer platform and receiving a reflected laser beam to determine a tilt angle of the wafer platform by the intensity of the reflected laser beam.

Growing community of inventors

Hsin-Chu, Taiwan

Wu-Han Jiang