Asml Netherlands B.v.

Asml Holding N.v.

Wouter Vanesch

Thomas Poiesz

Abraham Alexander Soethoudt

Coen Hubertus Matheus Baltis

Mehmet Ali Akbas

Marcel Maria Cornelius Franciscus Teunissen

Dennis Van Den Berg

A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.

Substrate holder for use in a lithographic apparatus

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Lummen, Belgium

Wouter Vanesch