Samsung Electronics Co., Ltd.

Wooyong Cho

Gun Huh

The inventive concepts provide a method of providing a stochastic prediction system. The method includes extracting contours of patterns corresponding to a first design layout from a plurality of scanning electron microscope (SEM) images, respectively, generating a first contour histogram image based on the contours, and training a stochastic prediction model by using the first contour histogram image as an output, and by using the first design layout and a first resist image, a first aerial image, a first slope map, a first density map, and/or a first photo map corresponding to the first design layout as inputs, in which the stochastic prediction model comprises a cycle generative adversarial network (GAN).

Stochastic contour prediction system, method of providing the stochastic contour prediction system, and method of providing EUV mask using the stochastic contour prediction system

Growing community of inventors

Gyeonggi do, South Korea

Wooyong Cho