Samsung Electronics Co., Ltd.

Woong-Kyu Son

Deok-Yong Kim

Soo-Bok Chin

Ji-Hye Lee

Sung-Soo Moon

Kwang-Hoon Kim

Choon-Shik Leem

Jung-Hoon Byun

Jae-Kwan Park

Hyo-Cheon Kang

Jeong-ho Ahn

The inventive concept provides apparatuses and methods for monitoring semiconductor fabrication processes in real time using polarized light. In some embodiments, the apparatus comprises a light source configured to generate light, a beam splitter configured to reflect the light toward the wafer being processed, an objective polarizer configured to polarize the light reflected toward the wafer and to allow light reflected by the wafer to pass therethrough, a blaze grating configured to separate light reflected by the wafer according to wavelength, an array detector configured to detect the separated light and an analyzer to analyze the three-dimensional profile of the structure/pattern being formed in the wafer.

Methods for monitoring semiconductor fabrication processes using polarized light

Apparatus and method for monitoring semiconductor fabrication processes using polarized light

Methods of analyzing photolithography processes are provided. The methods may include obtaining an image from a pattern formed on a wafer and obtaining dimensions of the image. The methods may further include converting the dimensions into a profile graph and then dividing the profile graph into a low-frequency band profile graph and a high-frequency band profile graph.

Method of analyzing photolithography processes

Growing community of inventors

Hwaseong-si, South Korea

Woong-Kyu Son