Samsung Electronics Co., Ltd.

Woong Ko

Byung-kyu Lee

Du-hyun Lee

Jae-kwan Kim

Ki-yeon Yang

Hongseok Lee

Chanwook Baik

Changseung Lee

Wonjae Joo

Hongkyu Park

Jeongyub Lee

Doug-Yong Sung

Youngjin Cho

Chan Kwak

Hyeon Cheol Park

Kwanghee Kim

Eun-Hyoung Cho

Vasily Pashkovskiy

Se-jin Oh

Ki-ho Hwang

Eun-hyoung Cho

Yun Sung Woo

Hiesang Sohn

Weonho Shin

Dong-Su Ko

A meta optical device configured to sense incident light includes a plurality of nanorods each having a shape dimension less than a wavelength of the incident light. Each nanorod includes a first conductivity type semiconductor layer, an intrinsic semiconductor layer, and a second conductivity type semiconductor layer. The meta optical device may separate and sense wavelengths of the incident light.

Meta optical devices and methods of manufacturing the same

Disclosed herein are a microwave probe capable of precisely detecting a plasma state in a plasma process, a plasma monitoring system including the probe, and a method of fabricating a semiconductor device using the system. The microwave probe includes a body extending in one direction and a head which is connected to one end of the body and has a flat plate shape. In addition, in the plasma process, the microwave probe is non-invasively coupled to a chamber such that a surface of the head contacts an outer surface of a viewport of the chamber, and the microwave probe applies a microwave into the chamber through the head and receives signals generated inside the chamber through the head.

Microwave probe, plasma monitoring system including the microwave probe, and method for fabricating semiconductor device using the system

A transparent electrode includes a substrate; a first layer disposed on the substrate, the first layer including a graphene mesh structure, the graphene mesh structure including graphene and a plurality of holes; and a second layer disposed on the first layer, wherein the second layer includes a plurality of conductive nanowires.

Transparent electrodes and electronic devices including the same

An imprinting stamp and a nano-imprinting method using the imprinting stamp are provided. The imprinting stamp includes a first substrate; one or more field regions on the first substrate, the first substrate including nano-patterns; and a first dummy pattern region on the first substrate and adjacent to the field region, the dummy pattern region including first dummy patterns having greater dimensions than that of the nano-patterns, the first dummy patterns being a plurality of polygons, each of the polygons having a vertex pointing in a first direction proceeding from the field region toward the first dummy pattern region.

Imprinting stamp and nano-imprinting method using the same

A stamp includes a transparent body having an inner chamber containing an inlet/outlet tube configured to have a fluid injected and removed therefrom.

Stamp, method of fabricating the stamp, and imprint method using the same

A template system, and a nano-imprint method using the same, include a template having a nano-pattern and configured to transfer the nano-pattern to a resin material on a substrate, and a pressure controlling apparatus configured to change a pressure of the template with respect to the substrate according to an intensity of bubbles captured between the substrate and the template.

Template system and nano-imprint method using the same

A stamp includes at least one protrusion on a protrusion pattern, and an end portion of the at least one protrusion may have a non-planarized surface. The end portion of the protrusion may have a concave structure, that is, the end portion includes a center region and an edge region, and the edge region is higher than the center region.

Stamp, method of manufacturing the same, and imprinting method using the stamp

Methods of manufacturing a nanoimprint stamp are provided. The method may include forming a pattern on a surface of a master substrate, depositing an etch barrier layer on a surface of a stamp substrate, coating a photoresist on one of the surfaces of the master substrate and the stamp substrate on which an etch barrier layer is formed, forming a photoresist pattern by pressing the master substrate against the stamp substrate, forming a hard mask by etching the etch barrier layer using the photoresist pattern, and etching the stamp substrate using the hard mask as an etch mask.

Method of manufacturing nanoimprint stamp

A method of fabricating a nanoimprint stamp includes forming a resist pattern having a nano size width on a stamp substrate by performing imprint processes repeatedly. In the imprint processes, resist layers that are selectively etched are sequentially used. The stamp substrate is etched using the resist pattern as an etch mask.

Growing community of inventors

Hwaseong-si, South Korea

Woong Ko