Samsung Electronics Co., Ltd.

Samsung Sdi Co., Inc.

Wook Rae Kim

Jin Yong Kim

Kwang Soo Kim

Seung Woo Lee

Wataru Sotoyama

Sangho Park

Soonok Jeon

Hongsik Kim

Juhyun Kim

Eun-Sun Yu

Sangmo Kim

Mi-Young Chae

Hyunjung Kim

Yongsik Jung

Yeonsook Chung

Jongsoo Kim

Hyung-Sun Kim

Joonghyuk Kim

Dalho Huh

Hanseok Kim

Jhunmo Son

Hosuk Kang

Eunsuk Kwon

Namryul Jeon

Namheon Lee

Jaejun Chang

Dmitry Kravchuk

Sung Ho Jang

Hyejin Bae

Hasup Lee

Miyoung Chae

Dal-Ho Huh

Youngmok Son

Rupasree Ragini Das

Sungho Nam

Sunghan Kim

Virendra Kumar Rai

Minsik Min

Jun Chwae

Changho Noh

Youngseok Park

Chang-Woo Kim

Hyojoon Kim

Moo-Jin Park

Donghyuk Lim

Satoko Ishibe

Myung Jun Lee

Seyoung Park

Shigenobu Maeda

Won-Joon Son

Inhwan Song

Seo Yeon Jeong

Heejun Kim

Minhong Yun

Daehan Han

Seongjin Yoo

Gwang Sik Park

Dae Hoon Han

Beomkyu Seo

Soonwon Kwon

Wonjoon Son

Taerae Kim

An optical measurement apparatus includes a light source unit generating and outputting light, a polarized light generating unit generating polarized light from the light, an optical system generating a pupil image of a measurement target, using the polarized light, a self-interference generating unit generating multiple beams that are split from the pupil image, and a detecting unit detecting a self-interference image generated by interference of the multiple beams with each other.

Optical measurement apparatus, measuring method using the same, and method of fabricating semiconductor device using the same

Provided is a semiconductor process modeling system. The semiconductor process modeling system includes a preprocessing component configured to generate tensor data from raw data obtained from semiconductor manufacturing equipment, wherein, when the raw data is expressed as a raw matrix representing values of a plurality of process parameters for each of a plurality of wafers, at least one element of the raw matrix is omitted, when the tensor data is expressed as a tensor matrix representing values of a plurality of preprocessed process parameters for each of the plurality of wafers, the number of omitted elements of the tensor matrix is less than the number of omitted elements of the raw matrix, and the preprocessing component is configured to generate the tensor data by modifying the raw data based on at least one of characteristics of the semiconductor manufacturing equipment and characteristics of the plurality of process parameters.

Semiconductor process modeling system and method

A optical measurement apparatus includes: an optical system which generates a pupil image of a measurement target, using light; a polarization generator which generates a polarized light from the light; a self-interference generator which generates a plurality of beams divided from the pupil image, using the polarized light, and causes the plurality of beams to interfere with each other to generate a self-interference image; and an image analysis unit configured to extract phase data from the self-interference image, and to move the measurement target to a focus position on the basis of the phase data.

Optical measurement apparatus, measuring method using the same, and method for fabricating semiconductor device using the same

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Suwon-si, South Korea

Wook Rae Kim