Samsung Electronics Co., Ltd.

Wook-rae Kim

Byeong-hwan Jeon

Kwang-soo Kim

Young-kyu Park

Tae-joong Kim

Kohei Hashimoto

Nobuyuki Kimura

Ken Ozawa

Chang-Hoon Choi

Won-Don Joo

Jung-Chul Lee

Ji-hoon Kang

Jin-Woo Ahn

Hashimoto Kohei

Gwang-sik Park

Sung-Hwi Cho

Myung-jun Lee

Systems and methods related to a structured illumination (SI)-based inspection apparatus are described. The SI-based inspection apparatus may be capable of accurately inspecting an inspection object in real time with high resolution, while reducing the loss of light. Also described are an inspection method, and a semiconductor device fabrication method including the SI-based inspection method. The inspection apparatus may include a light source configured to generate and output a light beam, a phase shifting grating (PSG) configured to convert the light beam from the light source into the SI, a beam splitter configured to cause the SI to be incident on an inspection object and output a reflected beam from the inspection object, a stage capable of moving the inspection object and on which the inspection object is arranged, and a time-delayed integration (TDI) camera configured to capture images of the inspection object by detecting the reflected beam.

Structured illumination-based inspection apparatus and inspection method, and semiconductor device fabrication method including structured illumination-based inspection method

Provided are a plasma light source capable of solving a problem occurring when an arc discharge lamp is used and an inspection apparatus capable of providing uniform and high-brightness plasma light. The plasma light source includes a pulse laser generator configured to generate a pulse laser beam, a continuous wave (CW) laser generator configured to generate an infrared ray (IR) CW laser beam, a first dichroic mirror configured to transmit or reflect the pulse laser beam and reflect or transmit the IR CW laser beam, a chamber configured to receive the pulse laser beam to ignite plasma and the IR CW laser beam to maintain the plasma in an ignited state, and discharge plasma light generated by the plasma, and a second dichroic mirror configured to transmit the pulse laser beam and the IR CW laser beam and reflect the plasma light.

Plasma light source and inspection apparatus including the same

A plasma light source apparatus includes a first laser generator configured to generate a first laser. A second laser generator is configured to generate a second laser. A chamber is configured to accommodate and seal a medium material for plasma ignition and to allow plasma to be ignited by the first laser and to be maintained by the second laser. An inner surface of the chamber includes two curved mirrors that face each other.

Plasma light source apparatus and light source system including the same

A method of inspecting a surface of an object includes providing a laser beam irradiated in a first direction substantially parallel to the surface of the object, adjusting a diameter of the annular laser beam, reflecting the annular laser beam toward the surface of the object in a second direction substantially perpendicular to the first direction, in a primary reflection, and reflecting the primarily reflected laser toward an inspection region of the object, in a secondary reflection. An incident angle of the annular laser beam with respect to the surface of the object may be determined by the diameter of the annular laser beam.

Method of inspecting a surface of an object and optical system for performing the same

A rod lens for a lighting apparatus and a lighting apparatus including the rod lens are disclosed. The rod lens having a rectangular rod structure extends lengthwise and includes a first end and a second end opposing each other. The first end is a light incident surface and formed of one continuous surface. The second end is a light exit surface and formed of a plurality of separated surfaces.

Rod lens for lighting apparatus, lighting apparatus including the same and semiconductor manufacturing method using the apparatus

A plasma light source apparatus is provided. The plasma light source apparatus includes a chamber, a laser generating part, and a curved mirror. The chamber includes a plasma source gas for generating laser induced plasma. The laser generating part is spaced apart from the chamber and generates a hollow laser beam. The curved mirror is disposed between the chamber and the laser generating part. The curved mirror is configured to reflect and to condense the generated hollow laser beam into the chamber to generate the laser induced plasma in the chamber, and to reflect light emitted from the generated laser induced plasma.

Plasma light source apparatus and plasma light generating method

A plasma light source includes a chamber having an ionizable medium therein, an ignition source configured to provide first electromagnetic radiation to the chamber, a sustaining source configured to separately provide second electromagnetic radiation to the chamber, a first curved mirror positioned adjacent the chamber, and a second curved mirror positioned opposite the first mirror and arranged to direct the first electromagnetic radiation toward the chamber. The second electromagnetic radiation may be different than the first electromagnetic radiation. Related devices and methods of operation are also discussed.

Growing community of inventors

Suwon-si, South Korea

Wook-rae Kim