Electronics and Telecommunications Research Institute

Woojin Chang

Eun Soo Nam

Hae Cheon Kim

Jae Kyoung Mun

Sang Choon Ko

Jong-Won Lim

Hokyun Ahn

Young Rak Park

Dong Min Kang

Chi Hoon Jun

Hyung Sup Yoon

Sang-Heung Lee

Sung-Bum Bae

Seong-Il Kim

Hong Gu Ji

Seok-Hwan Moon

Jongmin Lee

Je Ho Na

Byoung-Gue Min

Soon Il Yeo

Dong-Young Kim

Kyu Jun Cho

Yoo Jin Jang

Chull Won Ju

Dong Yun Jung

Hyung Seok Lee

Woo-Young Jang

Jeho Na

Myungjoon Kwack

Hyun-Gyu Jang

Jae Won Do

Sungjae Chang

Hyunwook Jung

Jeong-Jin Kim

Min Jeong Shin

Jong Yul Park

Hyungyu Jang

Disclosed is a frequency mixer. The frequency mixer includes a first matching circuit that generates a matched local oscillator (LO) signal based on an LO signal, a non-linear circuit that generates a non-linear LO signal based on the matched LO signal, a second matching circuit that generates a matched radio frequency (RF) signal based on an RF signal, a mixing circuit that generates a mixed signal based on a mixing of the non-linear LO signal and the matched RF signal, a third matching circuit that generates an intermediate frequency (IF) signal based on the mixed signal, wherein the non-linear circuit includes a non-linear transistor, a bias transistor, and an internal matching circuit connected in series.

Frequency mixer including non-linear circuit

Provided is an amplification circuit for amplifying an input signal. The amplification circuit includes an input stage including an input matching circuit that receives the input signal and an input attenuation circuit that attenuates a gain for the input signal outside an operating frequency band of the amplification circuit, a transistor that amplifies the input signal provided from the input stage, and an output stage including an output matching circuit that receives a signal amplified by the transistor and an output attenuation circuit that attenuates the gain for the input signal outside the operating frequency band of the amplification circuit, and the input attenuation circuit includes a first resistor and a second resistor that are connected to a ground voltage, a first passive element connected between the input matching circuit and the second resistor, and a second passive element connected between the first passive element and the first resistor.

Microwave amplification circuit

Provided is a cascode circuit including first and second transistors connected between a drain terminal and a source terminal in cascode form, a level sifter configured to change a voltage level of a switching control signal applied to a gate terminal and provide the changed switching control signal to a gate of the first transistor, a buffer configured to delay the switching control signal and provide the delayed switching control signal to a gate of the second transistor, and a first resistor connected between the level shifter and the gate of the first transistor.

Cascode switch circuit including level shifter

Provided are a semiconductor device and a method of fabricating the same. The semiconductor device includes: an active region provided on a substrate; an inlet channel formed as a single cavity buried in one side of the substrate; an outlet channel formed as a single cavity buried in the other side of the substrate; a micro channel array comprising a plurality of micro channels, wherein the plurality of micro channels are formed as a plurality of cavities buried in the substrate, and one end of the micro channel array is connected to a side of the inlet channel and the other end of the micro channel array is connected to a side of the outlet channel; and a micro heat sink array separating the micro channels from one another.

Semiconductor device and method of fabricating the same

A semiconductor device includes a semiconductor structure including a substrate, a first semiconductor layer on the substrate, and a second semiconductor layer on the first semiconductor layer, a first passivation pattern provided on the semiconductor structure, and first and second conductive patterns provided on the semiconductor structure and spaced from the first passivation pattern.

Semiconductor device with passivation layer for control of leakage current

A cascode switch circuit includes a first transistor, a second transistor, and a protector. A first transistor receives a signal from a first terminal through a first end and transfers the signal to a second end in response to a first control signal. A second transistor delivers the signal that the first transistor transfers to a second terminal in response to a second control signal. A protector is connected between a gate of the first transistor and the second terminal. The first control signal is provided to allow the first transistor to operate in a normally-on state. The second control signal is provided to allow the second transistor to operate in a normally-off state.

Cascode switch circuit

Provided is switch circuit including first and second transistors, a source pad connected to a second node of the second transistor through a first signal path and connected to a gate node of the first transistor through a second signal path, a gate pad connected to a gate node of the second transistor through a third signal path; and a drain pad connected to a first node of the first transistor through a fourth signal path, wherein a second node of the first transistor and a first node of the second transistor are connected to each other through a fifth signal path, and the gate node of the first transistor and the second node of the second transistor are connected to each other through a sixth signal path separated from the first and second signal paths.

Switch circuit of cascode type having high speed switching performance

Provided is a method of manufacturing a nitride semiconductor device. The method includes forming a plurality of electrodes on a growth substrate on which first and second nitride semiconductor layers are sequentially stacked, forming upper metal layers on the plurality of electrodes respectively, removing the growth substrate to expose a lower surface of the first nitride semiconductor layer, and forming a third nitride semiconductor layer and a lower metal layer sequentially on the exposed lower surface of the first nitride semiconductor layer.

Methods of manufacturing nitride semiconductor devices

Provided is a nitride semiconductor device including: a substrate having through via holes; first and second nitride semiconductor layers sequentially stacked on the substrate; drain electrodes and source electrodes provided on the second nitride semiconductor layer; and an insulating pattern provided on the second nitride semiconductor layer, the insulating pattern having upper via holes provided on the drain electrodes, wherein the through via holes are extended into the first and second nitride semiconductor layers and expose a bottom of each of the source electrodes.

Nitride semiconductor device

A high electron mobility transistor includes a T-type gate electrode disposed on a substrate between source and drain electrodes and insulating layers disposed between the substrate and the T-type gate electrode. The insulating layers include first, second, and third insulating layers. The third insulating layer is disposed between the substrate and a head portion of the T-type gate electrode such that a portion of the third insulating layer is in contact with a foot portion of the T-type gate electrode. The second insulating layer is disposed between the substrate and the head portion of the T-type gate electrode to be in contact with the third insulating layer. The first insulating layer and another portion of the third insulating layer are sequentially stacked between the substrate and the head portion of the T-type gate electrode to be in contact with the second insulating layer.

Transistor and method of fabricating the same

A semiconductor package is provided. The semiconductor package includes a package body, a plurality of semiconductor chips, and an external connection terminal. The package body is stacked with a plurality of sheets where conductive patterns and vias are disposed. The plurality of semiconductor chips are inserted into insert slots extending from one surface of the package body. The external connection terminal is provided on other surface opposite to the one surface of the package body. Here, the plurality of semiconductor chips are electrically connected to the external connection terminal.

Semiconductor package and method of fabricating the same

Provided is a semiconductor package and a method of fabricating the same. The semiconductor package includes: a package body including a plurality of sheets; semiconductor chips mounted in the package body; and an external connection terminal provided on a first side of the package body, wherein the sheets are stacked in a parallel direction to the first side.

Disclosed are a semiconductor device and a method of manufacturing the same. In the semiconductor device according to an exemplary embodiment of the present disclosure, at the time of forming a source electrode, a drain electrode, a field plate electrode, and a gate electrode on a substrate having a heterojunction structure such as AlGaN/GaN, the field plate electrode made of the same metal as the gate electrode is formed on the side surface of a second support part positioned below a head part of the gate electrode so as to prevent the gate electrode from collapsing and improve high-frequency and high-voltage characteristic of the semiconductor device.

Method of manufacturing semiconductor device

Provided is a semiconductor device. The semiconductor device includes: a substrate; an active layer on the substrate; a capping layer on the active layer; source/drain electrodes on the capping layer; a gate electrode on the active layer; and a first void region on a first sidewall of the gate electrode and a second void region on a second sidewall facing the first sidewall.

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Daejeon, South Korea

Woojin Chang