Samsung Electronics Co., Ltd.

Woobin Song

Minhee Cho

Hyunmog Park

Sangkil Lee

Kiseok Lee

Sangwoo Lee

Mirco Cantoro

Minsu Lee

Beomyong Hwang

Heiseung Kim

Sungwon Yoo

Wonsok Lee

Minwoo Song

Mintae Ryu

Hyunsil Oh

A semiconductor device includes: a conductive line that extends in a first direction on a substrate; an insulating pattern layer on the substrate and having a trench that extends in a second direction, the trench having an extension portion that extends into the conductive line; a channel layer on opposite sidewalls of the trench and connected to a region, exposed by the trench, of the conductive line; first and second gate electrodes on the channel layer, and respectively along the opposite sidewalls of the trench; a gate insulating layer between the channel layer and the first and second gate electrodes; a buried insulating layer between the first and second gate electrodes within the trench; and a first contact and a second contact, respectively buried in the insulating pattern layer, and respectively connected to upper regions of the channel layer.

Semiconductor devices having vertical channel transistor structures and methods of fabricating the same

A memory device includes a substrate including first and second regions, the first region having first wordlines and first bitlines, and the second region having second wordlines and second bitlines, a first memory cell array including first memory cells in the first region, the first memory cell array having volatility, and each of the first memory cells including a cell switch having a first channel region adjacent to a corresponding first wordline of the first wordlines, and a capacitor connected to the cell switch, and a second memory cell array including second memory cells in the second region, the second memory cell array having non-volatility, and each of the second memory cells including a second channel region adjacent to a corresponding second wordline of the second wordlines, and a ferroelectric layer between the corresponding second wordline of the second wordlines and the second channel region.

Memory device having volatile and non-volatile memory cells

A semiconductor device includes: a substrate including an active region and a device isolation region; a flat plate structure formed on the substrate; an oxide semiconductor layer covering a top surface of the flat plate structure and continuously arranged on a top surface of the substrate in the active region and the device isolation region; a gate structure arranged on the oxide semiconductor layer and including a gate dielectric layer and a gate electrode; and a source/drain region arranged on both sides of the gate structure and formed in the oxide semiconductor layer, in which, when viewed from a side cross-section, an extending direction of the flat plate structure and an extending direction of the gate structure cross each other.

Semiconductor device

Memory device

A semiconductor memory device includes a memory cell array of a three-dimensional structure including a plurality of memory cells repeatedly arranged in a first horizontal direction and a second horizontal direction that are parallel with a main surface of a substrate and cross each other on the substrate and in a vertical direction perpendicular to the main surface, wherein each of the plurality of memory cells includes three transistors. A method of manufacturing a semiconductor memory device includes forming simultaneously a plurality of memory cells arranged in a row in a vertical direction on a substrate, wherein each of the plurality of memory cells includes three transistors.

Semiconductor memory device and method of manufacturing the same

A ferroelectric semiconductor device includes an active region extending in one direction, a gate insulating layer crossing the active region, a ferroelectric layer disposed on the gate insulating layer and including a hafnium oxide, a gate electrode layer disposed on the ferroelectric layer, and source/drain regions disposed on the active region to be adjacent to both sides of the gate insulating layer, wherein the ferroelectric layer includes 20% or more of orthorhombic crystals, and an upper surface of the source/drain region is located at a level equal to or higher than an upper surface of the ferroelectric layer.

Ferroelectric semiconductor device including a ferroelectric and manufacturing method thereof

Growing community of inventors

Hwaseong-si, South Korea

Woobin Song