Hynix Semiconductor Inc.

The Asan Foundation

Estsoft Corp.

Rifatron Co., Ltd.

Cj Cheiljedang Corporation

Woo Young Jung

Jong Jin Lee

Jae Seung Kim

Sung Yoon Cho

Choi Dong Kim

Pil Keun Song

Jun Seob Kim

Jung Su Oh

Jae Kwang Ryu

Tae Hoon Kwon

Hyo Young Jeong

Disclosed herein is a method for acquiring and processing a medical image, comprising obtaining the first to n-th sectional images of the first to n-th regions through non-sequential sectional-image acquisition starting from one of the first to n-th regions and sequentially arranging the obtained first to n-th sectional images.

Method for acquiring and processing medical images

The present invention relates to a method of defending against a spoofing attack using a blocking server, and more particularly, to a method of defending against a spoofing attack using a blocking server, which is characterized in that it involves inspecting an IP and MAC address included in an ARP packet received by a client in a network, and changing the addresses to a legitimate IP address and to a corresponding MAC address when the addresses are found to be used in a spoofing attack. According to the present invention, in the blocking of a spoofing attack against a network, an IP address and a MAC address for legitimate hardware connected to the network may be prestored and monitored, so as to exhibit the effect of an accurate defense being enabled in a short time.

Method of defending against a spoofing attack by using a blocking server

A method of forming a micro pattern in a semiconductor device, wherein a first polysilicon film, a buffer oxide film, a second polysilicon film, an anti-polishing film, and a first oxide film are sequentially laminated on a semiconductor substrate having a to-be-etched layer. The first oxide film, the anti-polishing film and the second polysilicon film are patterned. After nitride film spacers are formed on the patterned lateral portions, a second oxide film is formed on the entire structure. A Chemical Mechanical Polishing (CMP) process is performed using the anti-polishing film as a stopper. Thereafter, after the nitride film spacers are removed, the second oxide film and the second polysilicon film are removed using a difference in etch selective ratio between the oxide film and the polysilicon film. A hard mask for forming a micro pattern having a structure in which the first polysilicon film and the buffer oxide film are laminated is formed. The to-be-etched layer is etched using the hard mask as an etch barrier.

Method of forming micro pattern in semiconductor device

A moving image compression/decompression apparatus and method that uses, for example, a wavelet transform technique in order to improve a compression rate is disclosed. The moving image compression/decompression apparatus includes an A/D converter for converting moving image data into digital data. The digital data is divided into a plurality of level regions using a wavelet transformer. The apparatus also includes a quantizer for quantizing the data that has been transform with a predetermined weight that corresponds to each of the regions. The apparatus also includes an SZT coder for performing a lossless DPCM coding with respect to the data quantized sequentially form a high level region to a low level regionusing a similarity between the level regions based on a predetermined SZT map. A Huffman coder for encoding the data subject to SZT coding by the SZT coder based on the probability of high frequency components which exist in each of the level regions, and a stream file generator for outputting the data encoded by the Huffman coder as bit stream.

Moving image compression/decompression apparatus and method which use a wavelet transform technique

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Seoul, South Korea

Woo Young Jung