Snu Precision Co., Ltd.

Woo Jung Ahn

Jung Hwan Kim

Heui Jae Pahk

Heung Hyun Shin

Seong Ryong Kim

Jun Hyeok Lee

Hee Wook You

Disclosed is a method of measuring thickness or a surface profile of a thin film layer formed on a base layer through a white light scanning interferometry, the method including: preparing simulation interference signals corresponding to thicknesses by assuming a plurality of sample thin film layers different in thickness from one another and simulating interference signals with respect to the respective sample thin film layers; acquiring a real interference signal with respect to an optical-axis direction of entering the thin film layer by illuminating the thin film layer with white light; preparing a plurality of estimated thicknesses that the thin film layer may have on the basis of the real interference signal; comparing whether the simulation interference signal having thickness corresponding to the estimated thickness is substantially matched with the real interference signal; and determining the thickness of the simulation interference signal substantially matched with the real interference signal as the thickness of the thin film layer.

Estimating thickness based on number of peaks between two peaks in scanning white light interferometry

A plasma monitoring device includes a plasma supplier including a power supply, a reaction gas supply line, and an emission nozzle for emitting plasma, which is generated therein, toward an object; a camera unit for obtaining an image of the plasma emission state; and a controller for obtaining a measurement value by converting pixel information of the image into a numerical value and comparing it with a reference value, which is a measurement value in a normal emission state, to check the plasma emission state. The camera unit obtains an image of the plasma emission state, and the controller analyzes the image to obtain a measurement value, which is used to monitor the state of plasma in real time and control the amount of reaction gas supplied to the plasma supplier and the plasma discharge condition, so that plasma is evenly emitted from the plasma supplier.

Plasma monitoring device and method

A vision inspection system and a workpiece inspection method are used in inspecting a workpiece. The vision inspection system includes a level block having an upper surface whose opposite end regions are defined as a first position and a second position. A first transfer device has a table for supporting the workpiece. The first transfer device is installed on the upper surface of the level block for rectilinearly moving the table between the first position and the second position. A camera is arranged above the level block for taking an image of the workpiece to output image data. A second transfer device is installed on the upper surface of the level block for rectilinearly moving the camera between the first position and the second position. A computer is connected to the first transfer means, the camera and the second transfer means to control them in a specified manner.

Growing community of inventors

Gyeonggi-do, South Korea

Woo Jung Ahn