Intel Corporation

Wonil Chung

Tahir Ghani

Rishabh Mehandru

Mohammad Hasan

Varun Mishra

Pratik Patel

Gate-all-around integrated circuit structures having necked features, and methods of fabricating gate-all-around integrated circuit structures having necked features, are described. In an example, an integrated circuit structure includes a vertical stack of horizontal nanowires. Each nanowire of the vertical stack of horizontal nanowires has a channel portion with a first vertical thickness and has end portions with a second vertical thickness greater than the first vertical thickness. A gate stack is surrounding the channel portion of each nanowire of the vertical stack of horizontal nanowires.

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Hillsboro, OR, United States of America

Wonil Chung