Samsung Electronics Co., Ltd.

Wonbo Shim

Bongsoon Lim

Sang-Won Park

Sang-won Shim

Hojoon Kim

A semiconductor memory device includes a substrate, first memory cells that are connected to first word lines extending along a first direction and first bit lines extending along a second direction, over the substrate, first conductive materials that are connected to the first word lines and extend from the first word lines along a third direction perpendicular to the first direction and the second direction, second conductive materials that are connected to the first bit lines and extend along the first direction over the first bit lines, and third conductive materials that are connected to the second conductive materials and extend from the second conductive materials along the third direction.

Semiconductor memory device including parallel substrates in three dimensional structures

An erase method of a nonvolatile memory device including a plurality of cell strings on a substrate is provided. Each string includes a plurality of memory cells stacked in a direction perpendicular to the substrate, a ground select transistor between the memory cells and the substrate, and string select transistors between the memory cells and a bit line. The erase method includes applying a precharge voltage during a first time to a first string select line, floating the first string select line during a second time after the first time, and applying an erase voltage to the substrate after the first time. The first string select line is connected to the string select transistors at a first height in the cell strings of a same row.

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Suwon-si, South Korea

Wonbo Shim