Semes Co., Ltd.

Won Young Kang

Min Hee Cho

Kyeong Min Lee

Tae-Keun Kim

Kang Sul Kim

A substrate treating method including removing particles formed on a substrate by continuously performing a process of supplying a treatment liquid including a polymer and a solvent onto the substrate, forming a solidified liquid film by volatilizing the solvent in the treatment liquid, removing the solidified liquid film from the substrate by supplying a stripping liquid onto the substrate, and supplying a rinse liquid onto the substrate may be provided.

Substrate treating apparatus and substrate treating method

The inventive concept provides a substrate treating method. The substrate treating method includes supplying a dissolving solution onto a rotating substrate; and supplying, after the supplying a dissolution solution, a treating liquid including a polymer onto the rotating substrate to form a liquid film.

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Gimhae-si, South Korea

Won Young Kang