Korea Research Institute of Chemical Technology

Korea Institute of Science and Technology

Won-Yong Koh

Su-Jin Ku

Yun-Soo Kim

Chang-Gyoun Kim

Kyu-Sang Yu

An organometallic compound of formula LiOR&prime;.(R&prime;O)MR is vaporized at a low temperature and employed in a CVD process of a heterometallic oxide film of the LiMO type, wherein M is a Group 13 element such as Al or Ga; R is a C alkyl group; and R&prime; is a C alkyl group.

Process for preparing a limo2 type heterometallic oxide film

A novel organometallic compound of formula M[(.mu.-OR').sub.2 M'R.sub.2 ].sub.2 can be vaporized at a low temperature and advantageously employed in the CVD of a heterometallic oxide film of the MM'.sub.2 O.sub.4 type, wherein M is a divalent element such as Be, Mg, Zn or Cd; M' is a Group 13 element such as Al or Ga; and R and R' are each independently a C.sub.1-10 alkyl group, with the proviso that if M is Mg, M' is not Al.

Volatile organometallic compound containing a divalent metal and a group

Volatile magnesium alkylaluminum alkoxide and deposition of magnesium

A novel organometallic compound of formula M[(.mu.-OR').sub.2 M'R.sub.2 ].sub.2 can be vaporized at a low temperature and advantageously employed in the CVD of a heterometallic oxide film of the MM'.sub.2 O.sub.4 type, wherein M is a divalent element such as Be, Mg, Zn or Cd; M' is a Group 13 element such as Al or Ga; and R and R' are each independently a C.sub.1-10, alkyl group, with the proviso that if M is Mg, M' is not Al.

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Daejeon, South Korea

Won-Yong Koh