Gwangju Institute of Science and Technology

Won-Seok Seong

Dong-Seon Lee

Mun-Do Park

Jun-Youb Lee

Chang-Mo Kang

Dong-Ju Seo

Disclosed is a method for growing a nitride-based semiconductor with high quality, the method including: forming a first mask layer on a substrate and forming a second mask layer on the first mask layer; performing dry etching on the first mask layer and the second mask layer to form an opening in which a part of the substrate is exposed; performing selective wet etching on the first mask layer in the opening to form a recess in which a part of the substrate is exposed; depositing a third mask layer in the recess; and growing a nitride-based semiconductor from the exposed part of the substrate on sides of the third mask layer and expanding the growth via the opening.

Growing community of inventors

Gwangju, South Korea

Won-Seok Seong