Samsung Sdi Co., Inc.

Won Jung Kim

Jong Won Lee

Il Jin Kim

Irina Nam

Tae Ji Kim

Youn Jin Cho

Yoon Young Koo

Tae Won Park

Eui Rang Lee

Dong Il Han

Jung Hyo Lee

Young Hoon Kim

Oh Hyeon Hwang

Yoo Jin Suh

Hyeong Mook Kim

Bong Soo Park

Hyun Seung Kim

Provided are a silicone-based adhesive protection film and an optical member comprising same, the silicone-based adhesive protection film being formed of a composition comprising an alkenyl group-bearing organic polysiloxane mixture, an organic polysiloxane resin, a crosslinker, and a hydrosylication catalyst, wherein the alkenyl group-bearing organic polysiloxane mixture comprises component (i) and component (ii), and the organic polysiloxane resin comprises at least one of organic polysiloxane resins, each bearing a RRRSiOunit (R, R, and Rare each independently an alkyl group of 1 to 6 carbon atoms or an alkenyl group of 2 to 10 carbon atoms) and a SiOunit.

Silicone-based adhesive protection film and optical member comprising same

A CMP slurry composition for polishing a tungsten pattern wafer and a method of polishing a tungsten pattern wafer, the CMP slurry composition including a solvent, the solvent being a polar solvent or a non-polar solvent; an abrasive agent; and a biocide, wherein the abrasive agent includes silica modified with a silane containing two nitrogen atoms or silica modified with a silane containing three nitrogen atoms, the biocide includes a compound of Formula 3:

CMP slurry composition for polishing tungsten pattern wafer and method of polishing tungsten pattern wafer using the same

Disclosed herein are an adhesive protective film, an optical member including the same, and an optical display including the same. An adhesive protective film is formed of a composition including a (meth)acrylic binder derived from a monomer mixture including: an alkyl group-containing (meth)acrylic monomer; and at least one selected from among a hydroxyl group-containing (meth)acrylic monomer, a carboxyl group-containing (meth)acrylic monomer, and a polysiloxane (meth)acrylate, the adhesive protective film having an initial peel strength of about 100 gf/inch or less and a peel strength decrease rate of about 50% or less, as calculated according to Equation 1.

Adhesive protective film, optical member comprising the same and optical display comprising the same

A CMP slurry composition for polishing a tungsten pattern wafer and a method of polishing a tungsten pattern wafer, the composition including a solvent, the solvent including a polar solvent or a non-polar solvent; an abrasive agent; and an oxidizing agent, wherein the abrasive agent includes silica modified with an amino silane that includes three nitrogen atoms.

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Suwon-si, South Korea

Won Jung Kim