Lg Display Co., Ltd.

Lg Philips Lcd Co., Inc.

Won-Ho Cho

Gyoo-Chul Jo

Jin-Gyu Kang

Gue-Tai Lee

Jin-Young Kim

Beung-Hwa Jeong

Beung-Ilwa Jeong

An etchant for forming double-layered signal lines and electrodes of a liquid crystal display device includes hydrogen peroxide (HO), a phosphate, F-ions, an organic acid having a carboxyl group (&#x2014;COOH), a copper (Cu) inhibitor, and a hydrogen peroxide (HO) stabilizer, wherein each of the double-layered signal lines and electrodes of the liquid crystal display device includes a first layer of one of aluminum (Al), aluminum alloy (Al-alloy), titanium (Ti), titanium alloy (Ti-alloy), tantalum (Ta), and a tantalum alloy (Ta-alloy) and a second layer of copper (Cu).

Etchant for etching double-layered copper structure and method of forming array substrate having double-layered copper structures

A method of forming an array substrate for a LCD device includes patterning a first metal layer and a first barrier metal layer to form a gate electrode, a gate line and a gate pad; forming a gate insulation layer to cover the gate electrode, line and pad; forming an active layer, an ohmic contact layer, a second barrier metal layer and a second metal layer including a copper (Cu) layer on the gate insulation layer; patterning the second metal layer and the second barrier metal layer by a first etching process; patterning an exposed portion of the second metal layer and the second barrier metal layer and ohmic contact layer to form source and drain electrodes each having a double layered structure of the second barrier metal layer and the second metal layer; and forming a pixel electrode on a passivation layer formed on the source and drain electrodes.

Method of manufacturing an array substrate for LCD device having doubled-layered metal structure

An array substrate in a liquid crystal display device includes a gate electrode, a gate line and a gate pad on a substrate, wherein the gate electrode, the gate line and the gate pad have a double-layered structure consisting of a first metal layer and a first barrier metal layer in series from the substrate, and wherein the first metal is one of aluminum and aluminum alloy; a gate insulation laver; an active layer and an ohmic contact layer; a data line, source and drain electrodes, and a data pad each having a double-layered structure consisting of a second barrier metal layer and a second metal layer of copper; a passivation layer; and a pixel electrode, a gate pad terminal and a data pad terminal on the passivation layer formed of a transparent conductive material.

Method of manufacturing an array substrate for LCD device having double-layered metal structure

An array substrate in a liquid crystal display device includes a gate electrode, a gate line and a gate pad on a substrate, wherein the gate electrode, the gate line and the gate pad have a double-layered structure consisting of a first metal layer and a first barrier metal layer in series from the substrate, and wherein the first metal is one of aluminum and aluminum alloy; a gate insulation layer; an active layer and an ohmic contact layer; a data line, source and drain electrodes, and a data pad each having a double-layered structure consisting of a second barrier metal layer and a second metal layer of copper; a passivation layer; and a pixel electrode, a gate pad terminal and a data pad terminal on the passivation layer formed of a transparent conductive material.

Array substrate for LCD device having double-layered metal structure and manufacturing method thereof

The present invention is an array substrate for use in a liquid crystal display device, which includes a gate electrode, a gate line and a gate pad on a substrate, wherein the gate electrode, the gate line and the gate pad have a double-layered structure consisting of a first metal layer and a first barrier metal layer in series from the substrate, and wherein the first metal is one of aluminum and aluminum alloy; a gate insulation layer on the substrate covering the gate electrode, gate line and gate pad; an active layer and an ohmic contact layer sequentially formed on the gate insulation layer and over the gate electrode; a data line on the gate insulation layer perpendicularly crossing the gate line, source and drain electrodes contacting the ohmic contact layer, and a data pad on the gate insulation layer, wherein the data line, the source and drain electrode and the data pad have a double-layered structure consisting of a second barrier metal layer and a second metal layer of copper; a passivation layer formed on the gate insulation layer to cover the data line, source and drain electrodes, and data pad, wherein the passivation layer has a drain contact hole exposing a portion of the drain electrode, a gate pad contact hole exposing a portion of the gate pad, and a data pad contact hole exposing a portion of the data pad; and a pixel electrode, a gate pad terminal and a data pad terminal on the passivation layer, all of which are formed of a transparent conductive material on the passivation layer.

The present invention is an array substrate for use in a liquid crystal display device, which includes a gate electrode, a gate line and a gate pad electrode on a substrate, wherein all of the gate electrode, the gate line and the gate pad electrode have a first barrier metal layer, a first copper layer, and a first out-diffusion film that covers and surrounds the first copper layer. In the liquid crystal display device, the pixel electrode, gate pad terminal and data pad terminal are formed of a transparent conductive material on a passivation layer.

Array substrate for LCD device having metal-diffusion film and manufacturing method thereof

An array substrate for a liquid crystal display device includes a gate electrode, a gate line and a gate pad electrode disposed on a substrate, each of the gate electrode, the gate line and the gate pad electrode having a first metal barrier layer, a first copper alloy layer, and a first out-diffusion film, and the first out-diffusion film completely covering, surrounding and contacting entire surfaces of the first copper alloy layer. The array substrate includes a gate insulation layer disposed on the substrate and covering the gate electrode, the gate line and the gate pad electrode. An active layer and an ohmic contact layer are sequentially formed on the gate insulation layer and over the gate electrode. A data line is formed on the gate insulation layer and perpendicularly crosses the gate line. A source electrode and a drain electrode contact the ohmic contact layer.

Growing community of inventors

Gyeongsangbuk-do, South Korea

Won-Ho Cho