Samsung Electronics Co., Ltd.

Samsung Display Co., Ltd.

Semes Co., Ltd.

Won-Guk Seo

Hong-Sick Park

Bong-Kyun Kim

Jong-Hyun Choung

Sun-Young Hong

Sam-Young Cho

Shi-Yul Kim

Sang-woo Kim

Byeong-Jin Lee

Ki-beom Lee

Hyun-Cheol Shin

Sang-Woo Kim

Jean-Ho Song

Sung-Bong Kim

Wang-Woo Lee

Nam-Seok Suh

Hyun-cheol Shin

Suk-Won Lee

Jung-Hoon Baek

Hyun-Jin Min

Do-Won Kim

Ki-Beom Lee

Young-Woo Park

Seung-Yeon Han

A pickup apparatus includes a plurality of pickers sliding along a first direction and a space adjuster including a plurality of space adjusting plates. Each picker includes a protruding portion combined with a picker body, and each of the space adjusting plates is between a respective pair of adjacent pickers. The protruding portion of each picker contacts sidewalls of adjacent space adjusting plates. At least one of the space adjusting plates moves along a second direction crossing the first direction. A width in the first direction of each space adjusting plate varies along the second direction.

Pickup unit and pickup system of semiconductor device including the same

Exemplary embodiments of the present invention provide a metal wiring etchant. A metal wiring etchant according to an exemplary embodiment of the present invention includes ammonium persulfate, an organic acid, an ammonium salt, a fluorine-containing compound, a glycol-based compound, and an azole-based compound.

Etchant for metal wiring and method for manufacturing metal wiring using the same

An etchant includes about 0.1 percent by weight to about 30 percent by weight of ammonium persulfate (NH)SO, about 0.1 percent by weight to about 10 percent by weight of an inorganic acid, about 0.1 percent by weight to about 10 percent by weight of an acetate salt, about 0.01 percent by weight to about 5 percent by weight of a fluorine-containing compound, about 0.01 percent by weight to about 5 percent by weight of a sulfonic acid compound, about 0.01 percent by weight to about 2 percent by weight of an azole compound, and a remainder of water. Accordingly, the etchant may have high stability to maintain etching ability. Thus, manufacturing margins may be improved so that manufacturing costs may be reduced.

Etchant and method of manufacturing an array substrate using the same

Growing community of inventors

Seoul, South Korea

Won-Guk Seo