Samsung Electronics Co., Ltd.

Won-Don Joo

Sang-Min Lee

Sue-Jin Cho

Yu-sin Yang

Byeong-hwan Jeon

Woo-seok Ko

Sang-Woo Bae

Seong-Keun Cho

Jae-Hong Kim

Sang-Hyun Park

Sang-kil Lee

Kwang-Soo Kim

Sang Don Jang

Byeong Hwan Jeon

Sung-Yeol Kim

Anton Sergeevich Medvedev

Kyung-Min Lee

Wook-rae Kim

Young-kyu Park

Maksim Vladimirovich Riabko

Akinori Okubo

Min-Kook Kim

Hun-Yong Park

Jung-Chul Lee

Aleksandr Shorokhov

Jin-Woo Ahn

Mee-Hyun Lim

Taek-Jin Kim

Hashimoto Kohei

Byeong-Hwan Jeon

Seul-Gi Lee

Eun-Hee Jeang

Sung-Hwi Cho

Wook-Rae Kim

In a method of testing an interconnection substrate, a blocking condition of a reference light reflected from a probe having an intrinsic optical characteristic may be set. An electric field emitted from a test interconnection substrate having a plurality of circuits may change the intrinsic optical characteristics of the probe into test optical characteristics. Light may be irradiated to the probe having the test optical characteristics. The reference light reflected from the probe having the test optical characteristic may be blocked in accordance with the blocking condition. The remaining reflected light that may be due to an abnormal circuit may be detected.

Method of testing an interconnection substrate and apparatus for performing the same

A plasma monitoring system includes a plasma chamber performing plasma processes, first and second plasma sensing devices, and a controller. The first and second plasma sensing devices are respectively in a first horizontal direction and a second horizontal direction perpendicular to each other from a center point of a monitoring plasma plane in the plasma chamber. The first and second plasma sensing device generate first and second detection signals with respect to the monitoring plasma plane based on a first incident beam radiated from the monitoring plasma plane in the first horizontal direction and a second incident beam radiated from the monitoring plasma plane in the second horizontal direction. The controller detects two-dimensional plasma distribution information with respect to the monitoring plasma plane by performing a convolution operation based on the first and second detection signals, and controls the plasma processes based on the two-dimensional plasma distribution information.

Plasma sensing device, plasma monitoring system and method of controlling plasma processes

In a method of detecting a defect on a substrate, an incident beam may be radiated to a surface of the substrate to generate reflected light beams. A second harmonic generation (SHG) beam among the reflected light beams may be detected. The SHG beam may be generated by a defect on the substrate. A nano size defect may be detected by examining the SHG beam.

Method of detecting a defect on a substrate, apparatus for performing the same and method of manufacturing semiconductor device using the same

A maskless exposure method includes spatially modulating a light output from a light source into a pattern beam having a mask pattern, condensing the modulated pattern beam into a first group of spot beams having a first focal position on a Z-axis substantially perpendicular to an exposure surface of an object layer, and into a second group of spot beams having a second focal position different from the first focal position, and scanning the object layer with the first and second groups of spot beams. The object layer has a first height and a second height different from the first height.

Maskless exposure method, maskless exposure apparatus and method of manufacturing a semiconductor device using the same

A plasma light source apparatus includes a first laser generator configured to generate a first laser. A second laser generator is configured to generate a second laser. A chamber is configured to accommodate and seal a medium material for plasma ignition and to allow plasma to be ignited by the first laser and to be maintained by the second laser. An inner surface of the chamber includes two curved mirrors that face each other.

Plasma light source apparatus and light source system including the same

Provided are a light source device and a semiconductor manufacturing apparatus including the same. The light source device includes a light-emitting lamp. The light source device includes a laser generator configured to generate and direct a laser beam to the light-emitting lamp. The light source device includes a recycling optical element configured to redirect the laser beam to the light-emitting lamp. The recycling optical element includes a first recycling optical modulator configured to change the phase of the laser beam.

Light source device and semiconductor manufacturing apparatus including the same

An illumination optic system includes a convex mirror to reflect light from a light source to towards a lens. The light source is at a first focus position and the lens is at a second focus position of the mirror. The system also includes a reflector to reflect light not incident on the lens toward the convex mirror. The reflector has a light guide hole to guide light to the incidence surface of the lens.

Reflector structure of illumination optic system

A broadband light illuminator of an optical inspector for optically detecting defects of an inspection object may include an electrode-less chamber including a plasma area from which broadband light is generated; a first energy provider, exterior to the chamber, configured to provide first energy for ionizing high pressure gases to form ionized gases in the chamber; a second energy provider, exterior to the chamber, configured to provide second energy for transforming the ionized gases into a plasma state to form the plasma area at a central portion of the chamber; an elliptical reflector having a first focus at which the chamber is positioned and a second focus such that the broadband light is reflected from the elliptical reflector toward the second focus; and a lens unit focusing the reflected broadband light onto the inspection object to form an inspection light for detecting the defects of the inspection object.

Broadband light illuminators

Growing community of inventors

Incheon, South Korea

Won-Don Joo