Samsung Electronics Co., Ltd.

Won Ceak Pak

Yuri Nikolaevich Tolmachev

Vasily Pashkovskiy

Vladimir Volynets

Yung Hee Lee

Andrey Ushakov

Sung Chang Park

An apparatus and method to generate plasma which can be applied to semiconductor processing. The apparatus includes a chamber having a plasma generating space defined therein, a lower electrode positioned within the chamber, an upper electrode facing the lower electrode and disposed within the chamber to constitute a first plasma generating source, a second plasma generating source positioned at a higher location than that of a lower surface of the upper electrode and disposed at an outer circumference of the upper electrode, and a power supply to supply power to the first and second plasma generating sources.

Growing community of inventors

Seoul, South Korea

Won Ceak Pak